Chemical vapour deposition

Moorfield’s nanoCVD range allow for rapid, cost-effective production of graphene and carbon nanotubes using scalable Chemical Vapour Deposition (CVD) methods.

Developed together with academic partners and with proven performance including high-impact publications.

Graphene and carbon nanotubes (CNTs) have been the focus of huge research efforts, given their unique electrical, mechanical and structural properties. Thanks to these properties, their introduction is expected to prove disruptive for a huge range of applications. In addition, exotic characteristics of these materials mean they will enable new types of devices and products.

nanoCVD systems from Moorfield are designed to produce conditions that allow for rapid, cost-effective production of graphene and carbon nanotubes (CNTs), through the implementation of chemical vapour deposition (CVD) schemes. CVD methods are considered most promising for the industrial production of high-quality carbon nanomaterials.

System development has been carried out in collaboration with academic partners and has been awarded financial support for innovation. The tools are compact, easy-to-use and offer proven performance (including peer-reviewed publications in high profile journals).

Technical notes about Chemical vapour deposition:

Moorfield graphene soft-etching technology allows for the controlled removal of graphene and 2D materials, without cross-linking photoresists that can lead to residual contamination that…

Moorfield systems for Chemical vapour deposition:

A benchtop graphene CVD system for rapid, on-demand synthesis of high-quality graphene. Fully automated cold-wall technology for reduced contamination and running costs, and enhanced…
A compact, turn-key and scalable CVD system for high-throughput carbon nanotube synthesis – with proven performance….
A compact, plasma-enhanced, wafer-scale CVD (Chemical Vapour Deposition) system for rapid synthesis of high-quality graphene….

Recent news posts about Chemical vapour deposition:

Don’t land yourself in cold water. Protect your investment with a chiller…
Moorfield Nanotechnology Limited (Knutsford, UK) recently announced the appointment of a new distributor for their PVD, CVD and etch products for the Australia and…
Moorfield will be at the RAMS 2017 conference at the University of Exeter. Come along to meet our expert sales engineers and to see demos of…
Macháč, P., et al. Journal of Electrical Engineering 2017 DOI: 10.1515/jee-2017-0011 The work reports the synthesis of few-layer graphene films at the interface of…
Macháč, P., et al. ElectroScope 2016 The paper demonstrates the production of graphene using the cold-walled method as implemented in the nanoCVD-8G. Link: http://147.228.94.30/index.php?option=com_content&view=article&id=468:graphene-growth-by-chemical-vapor-deposition-process-on-copper-foil&catid=59:2016-12-12-09-18-59&Itemid=56 Moorfield…
Alexeev, A. A., et al. 2D Materials 2016 DOI: 10.1088/2053-1583/4/1/011010 This paper reports a simple method for the production of functional devices from CVD…
Wagner, S. et al. Microelectronic Engineering 2016 DOI: 10.1016/j.mee.2016.02.065 In this work, graphene, fabricated using a Moorfield nanoCVD-8G system, was transferred onto pre-fabricated microcavity…
Another month, another demo tour! This time, up to the north-east UK. Thanks to all who came along to live demonstrations of our nanoETCH and nanoCVD products for…
Gahoi, A. et al. Solid-State Electronics 2016 DOI: 10.1016/j.sse.2016.07.008 The contact resistance of various metals to chemical vapor deposited (CVD) monolayer graphene is investigated….
Moorfield are planning their latest demo tour. This time we’ll be heading to the English West Country and South Wales. We’ll be bringing nanoETCH…
Moorfield are pleased to announce the latest model in their nanoCVD range, model nanoCVD-WPG. The nanoCVD-WPG is a wafer-scale, plasma-enhanced CVD system for graphene…
A team at Warwick University have developed an innovative new approach for transferring graphene from growth to application substrates. The new method results in less contamination…

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