Chemical vapour deposition

Moorfield’s nanoCVD range allow for rapid, cost-effective production of graphene and carbon nanotubes using scalable Chemical Vapour Deposition (CVD) methods.

Developed together with academic partners and with proven performance including high-impact publications.

Graphene and carbon nanotubes (CNTs) have been the focus of huge research efforts, given their unique electrical, mechanical and structural properties. Thanks to these properties, their introduction is expected to prove disruptive for a huge range of applications. In addition, exotic characteristics of these materials mean they will enable new types of devices and products.

nanoCVD systems from Moorfield are designed to produce conditions that allow for rapid, cost-effective production of graphene and carbon nanotubes (CNTs), through the implementation of chemical vapour deposition (CVD) schemes. CVD methods are considered most promising for the industrial production of high-quality carbon nanomaterials.

System development has been carried out in collaboration with academic partners and has been awarded financial support for innovation. The tools are compact, easy-to-use and offer proven performance (including peer-reviewed publications in high profile journals).

Moorfield systems for Chemical vapour deposition:

nanoCVD-WPG

nanoCVD-WPG

A compact, plasma-enhanced, wafer-scale CVD (Chemical Vapour Deposition) system for rapid synthesis of high-quality graphene.

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nanoCVD-8N

nanoCVD-8N

A compact, turn-key and scalable CVD system for high-throughput carbon nanotube synthesis – with proven performance.

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nanoCVD-8G

A benchtop graphene CVD system for rapid, on-demand synthesis of high-quality graphene. Fully automated cold-wall technology for reduced contamination and running costs, and enhanced conditions control.

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Recent posts about Chemical vapour deposition:

Graphene soft-etching with the nanoETCH

Moorfield graphene soft-etching technology allows for the controlled removal of graphene and 2D materials, without cross-linking photoresists that can lead to residual contamination that affects device performance.

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