Chemical vapour deposition

Moorfield’s nanoCVD range allow for rapid, cost-effective production of graphene and carbon nanotubes using scalable Chemical Vapour Deposition (CVD) methods.

Developed together with academic partners and with proven performance including high-impact publications.

Graphene and carbon nanotubes (CNTs) have been the focus of huge research efforts, given their unique electrical, mechanical and structural properties. Thanks to these properties, their introduction is expected to prove disruptive for a huge range of applications. In addition, exotic characteristics of these materials mean they will enable new types of devices and products.

nanoCVD systems from Moorfield are designed to produce conditions that allow for rapid, cost-effective production of graphene and carbon nanotubes (CNTs), through the implementation of chemical vapour deposition (CVD) schemes. CVD methods are considered most promising for the industrial production of high-quality carbon nanomaterials.

System development has been carried out in collaboration with academic partners and has been awarded financial support for innovation. The tools are compact, easy-to-use and offer proven performance (including peer-reviewed publications in high profile journals).

Moorfield systems for Chemical vapour deposition:

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