Solutions

Complete thermal processing systems and bespoke components for high-temperature sample processing under controlled low-pressure, inert and reactive atmospheres….
Thermal evaporation is a straightforward means of thin film deposition with materials being heated to evaporation temperatures via a resistively heated support….
Plasma etching technology from Moorfield is used for for Soft Etching of sensitive materials, reactive ion etching (RIE) and for substrate cleaning. The technology…
Plasma etching technology from Moorfield is used for for Soft Etching of sensitive materials, reactive ion etching (RIE) and for substrate cleaning. The technology…
Nanoparticle vacuum deposition sources allow for the deposition, under high-vacuum conditions, of nanoparticles with sizes in the range of 1–20 nm. The sources can…
In magnetron sputtering, magnetic fields focus plasmas onto target material surfaces, ejecting material that moves through the plasma to coat substrates. Suitable for depositing…
In low temperature evaporation (LTE), resistive heating is used to evaporate materials held in a crucible….
Moorfield introduce their glovebox-integrated MiniLab 026 “soft-etching” tools for researchers working on graphene and 2D materials that require sample handling in inert atmospheres….
Glovebox-compatible MiniLab systems for physical vapour deposition (PVD), etching and annealing processes….
Glovebox Deposition integrated MiniLab PVD systems for metals, inorganics and organics thin-film deposition with sample handling in inert environments….
Glovebox Annealing Integrated MiniLab systems with annealing hardware for substrate heating under controlled conditions, and transfer to/from inert atmospheres….
During electron beam evaporation (or E-Beam evaporation), evaporant materials are heated to high temperatures through bombardment by high-energy electron streams….

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