Plasma etching is an excellent way to clean substrate surfaces, promote adhesion and optimise sample quality layers
Moorfield provide a range of laboratory systems for PVD, CVD, etch and annealing.
We listen to requirements and routinely build solutions per specific applications. Browse below to discover more about the various ways we help our customers.
Small-scale R&D to pilot-scale production systems for thin-film deposition. Multiple techniques, e-beam, magnetron sputtering, low- and high-temperature thermal evaporation. Range of chamber sizes and pumping system to suit all budgets.
Our nanoCVD range consists of systems optimised for the rapid, high-throughput production of graphene and single-walled carbon nanotubes via the chemical vapour deposition (CVD) technique. The systems use cold-walled technology to provide rapid, high-throughput production of high-quality CVD carbon nanomaterials. All systems are designed for benchtop positioning with minimal installation requirements.
Developed with the Nobel Prize-winning graphene group at Manchester University, UK, etching technology from Moorfield is unique in providing the fine control needed for substrate and device preparation in world-leading 2D materials research. We can provide systems and retrofit components to your existing tools.
Physical Vapour Deposition
PVD systems have been at the core of our business for two decades.
We have PVD systems for all forms of thermal evaporation and magnetron sputtering, for deposition of all material classes: metals, insulators and organics. From the entry-level M307 to the flagship MiniLab series, we can supply a system configured to your needs.
Flexible, modular systems for high-quality R&D and pilot-scale production thin-film deposition.
Moorfield’s flagship range of high-end MiniLab systems are flexible, modular systems for high-quality R&D and pilot-scale production thin-film deposition. Infinitely customisable to address a huge range of customer requirements.
Chemical Vapour Deposition
Moorfield’s nanoCVD range allow for rapid, cost-effective production of graphene and carbon nanotubes using scalable Chemical Vapour Deposition (CVD) methods.
Developed together with academic partners and with proven performance including high-impact publications.
Graphene and carbon nanotubes (CNTs) have been the focus of huge research efforts, given their unique electrical, mechanical and structural properties. Thanks to these properties, their introduction is expected to prove disruptive for a huge range of applications. In addition, exotic characteristics of these materials mean they will enable new types of devices and products.
nanoCVD systems from Moorfield are designed to produce conditions that allow for rapid, cost-effective production of graphene and carbon nanotubes (CNTs), through the implementation of chemical vapour deposition (CVD) schemes. CVD methods are considered most promising for the industrial production of high-quality carbon nanomaterials.
System development has been carried out in collaboration with academic partners and has been awarded financial support for innovation. The tools are compact, easy-to-use and offer proven performance (including peer-reviewed publications in high profile journals).
Soft-etching technology from Moorfield is unique in providing the fine control needed for substrate and device preparation in world-leading 2D materials research.
Developed in collaboration with the Nobel Prize-winning graphene group at Manchester University, UK.
Headed by Prof. Andre Geim, the graphene group at the University of Manchester received their first soft-etching system from Moorfield when they started their 2D materials research over 10 years ago. Since then, the system has become a critical part of all experimental work.
Moorfield soft-etching technology is optimised for providing the fine control required for substrate and device preparation in graphene and 2D materials research:
- Substrate preparation for mechanical exfoliation: When preparing 2D material ‘flakes’ via mechanical exfoliation (also known as the sticky-tape method), the nature of the substrate surface is crucial. Soft-etching tools are now being used to obtain the topological and chemical substrate surface properties necessary for producing large flake areas.
- 2D material patterning: Given their thinness, 2D materials are fragile and require finely-controlled etching conditions for device fabrication. Soft-etching technology provides this control and also allows for patterning without cross-linking common mask photoresists (e.g., PMMA).
- Defect engineering: A key research theme for graphene science is defect engineering. Through controlled low plasma-powers, soft-etching technology is being used for creating point defects in lattices for implementing control over this aspect of the material. Fine control is necessary for reproducible results and to avoid uncontrolled material destruction.
Moorfield technology is unique and offers unmatched performance for these applications. In recognition of this, we have recently installed 3 soft-etching systems into the new National Graphene Institute in the UK. We can now offer a dedicated nanoETCH system, incorporate the technology into our MiniLab tools, or provide components and advice for their retrofitting.
Complete thermal processing systems and bespoke components for high-temperature sample processing under controlled low-pressure, inert and reactive atmospheres.
Substrate heating is a common laboratory requirement, for numerous applications. Moorfield produce complete systems for precisely-controlled substrate heating up to 1000 °C under controlled atmospheres. A variety of different heating technologies are available—depending on the application. Stand-alone components including heating stages and power supplies can also be supplied.