Moorfield Nanotechnology

Complete thermal processing systems and bespoke components for high-temperature sample processing under controlled low-pressure, inert and reactive atmospheres.

Thermal evaporation is a straightforward means of thin film deposition with materials being heated to evaporation temperatures via a resistively heated support.

Plasma etching technology from Moorfield is used for for Soft Etching of sensitive materials, reactive ion etching (RIE) and for substrate cleaning. The technology is available packaged into dedicated nanoETCH tools or in combination with other hardware inside larger MiniLab process chambers and load-locks.

PVD systems have been at the core of our business for two decades.

Nanoparticle vacuum deposition sources allow for the deposition, under high-vacuum conditions, of nanoparticles with sizes in the range of 1–20 nm. The sources can be fitted to MiniLab systems with process chambers customised for accepting the necessary hardware.

In magnetron sputtering, magnetic fields focus plasmas onto target material surfaces, ejecting material that moves through the plasma to coat substrates. Suitable for depositing most materials (with correct choice of sputtering power supply).

In low temperature evaporation (LTE), resistive heating is used to evaporate materials held in a crucible.

Moorfield introduce their glovebox-integrated MiniLab 026 “soft-etching” tools for researchers working on graphene and 2D materials that require sample handling in inert atmospheres.

Glovebox-compatible MiniLab systems for physical vapour deposition (PVD), etching and annealing processes.