nanoPVD

High-performance, high-vacuum PVD systems in a compact package for benchtop location. Can be equipped for evaporation or magnetron sputtering techniques and, most recently, a combination of both. Superior, efficient performance for a multitude of R&D thin-film deposition applications.

nanoPVD S10A
nanoPVD-S10A
A benchtop, RF and DC magnetron sputtering system for metals and insulating materials. Compact as an electron microscopy coater, but with high-end hardware for research-grade results.
nanoPVD S10A
nanoPVD-S10A-WA
The nanoPVD-S10A-WA is a Wide-Area configuration that extends the capabilities of the nanoPVD-S10A to allow for even coating of substrate diameters up to 8″, in a benchtop package. RF and DC magnetron sputtering allow for deposition of both metals and insu
nanoPVD-ST15A
nanoPVD-ST15A
Model ST15A offers the combination of evaporation and sputtering techniques within a single process chamber. Ultimate research flexibility within a benchtop, automated package.
nanoPVD-T15A
nanoPVD-T15A
High-performance metals, organic evaporation in compact packages for benchtop location. Superior, efficient performance and ideal for OLED, OPV and OFET research.

Moorfield have recently introduced the nanoPVD series of deposition systems.

Compact and suitable for benchtop location—but not to be confused with microscopy-related products—nanoPVD system design is derived from proven R&D thin-film system technology such as that used in our flagship MiniLab range.

Developed in collaboration with leading academic groups, nanoPVD tools are optimised for ease-of-use, represent outstanding value for money and are ideal where available space and budgets are key considerations—without compromising on quality of results.

The nanoPVD range now consists of multiple models covering both magnetron sputtering and thermal evaporation deposition techniques. For further details, see the links at the bottom of this page.

Key features

  • Benchtop configuration
  • Fully automatic operation via touchscreen HMI
  • Define/save multiple process recipes
  • PC connection for data-logging
  • Base pressures <5 × 10-7 mbar
  • Heating, Z-shift and rotation stages (optional)
  • Equipped for easy servicing
  • Comprehensive safety features
  • Cleanroom compatible
  • Proven performance
  • Short lead times
  • Outstanding value for money
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