Thermal processing

Complete thermal processing systems and bespoke components for high-temperature sample processing under controlled low-pressure, inert and reactive atmospheres.

Substrate heating is a common laboratory requirement, for numerous applications. Moorfield produce complete systems for precisely-controlled substrate heating up to 1000 °C under controlled atmospheres. A variety of different heating technologies are available—depending on the application. Stand-alone components including heating stages and power supplies can also be supplied.

Technical notes about Thermal processing:

An introductory explanation of substrate adhesion, and how this can be improved….

Moorfield systems for Thermal processing:

High-temperature vacuum annealing for planar substrates, up to 1000 °C, with precision gas and pressure control—all in a benchtop package….

Recent news posts about Thermal processing:

Research-grade vacuum deposition with inert sample handling…
Moorfield are pleased to announce their latest product range—ANNEAL systems for 2D materials research!…
Gahoi, A. et al. Solid-State Electronics 2016 DOI: 10.1016/j.sse.2016.07.008 The contact resistance of various metals to chemical vapor deposited (CVD) monolayer graphene is investigated….

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