Thermal processing

Complete thermal processing systems and bespoke components for high-temperature sample processing under controlled low-pressure, inert and reactive atmospheres.

Substrate heating is a common laboratory requirement, for numerous applications. Moorfield produce complete systems for precisely-controlled substrate heating up to 1000 °C under controlled atmospheres. A variety of different heating technologies are available—depending on the application. Stand-alone components including heating stages and power supplies can also be supplied.

Moorfield systems for Thermal processing:

ANNEAL

ANNEAL

High-temperature vacuum annealing for planar substrates, up to 1000 °C, with precision gas and pressure control—all in a benchtop package.

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Recent posts about Thermal processing:

ICFO

ICFO

ICFO – The Institute of Photonic Sciences is a research center devoted to the science and technology of light. Located in Castelldefels, Barcelona, Spain

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