Thermal processing

Complete thermal processing systems and bespoke components for high-temperature sample processing under controlled low-pressure, inert and reactive atmospheres.

Substrate heating is a common laboratory requirement, for numerous applications. Moorfield produce complete systems for precisely-controlled substrate heating up to 1000 °C under controlled atmospheres. A variety of different heating technologies are available—depending on the application. Stand-alone components including heating stages and power supplies can also be supplied.

Thermal processing products

High-temperature vacuum annealing for planar substrates, up to 1000 °C, with precision gas and pressure control—all in a benchtop package.

Knowledge base articles about Thermal processing

Knowledge base

Substrate adhesion of sputtered films
Substrate adhesion of sputtered films
An introductory explanation of substrate adhesion, and how this can be improved….

Recent news about Thermal processing

Tools that fit like a glove
Research-grade vacuum deposition with inert sample handling…
Moorfield announces new product range: ANNEAL
Moorfield are pleased to announce their latest product range—ANNEAL systems for 2D materials research!…
Contact resistance study of various metal electrodes with CVD graphene

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