Flexible Configurations
Atmosphere-Sensitive
Applications
System
Soft Etch
Controlled Atmospheres
Benchtop and modular systems for PVD, CVD and Etch applications.
Learn about Physical Vapour Deposition, CVD and Etch techniques.
Benchtop nanoPVD
nanoPVD-S10A
Optimised for magnetron sputtering, the nanoPVDS10 is a benchtop, RF and DC magnetron sputtering system for metals and insulating materials. Compact as an electron microscopy coater, but with high-end hardware for research-grade results.
Reactive Ion Etching
Fluorine Based Etching of h-BN, SiO2 and Si Bulk
This application note demonstrates the effectiveness of fluorine-chemistry etchant gases SF6 and CHF3 for etching of h-BN (sidewalls and bulk), SiO2 and Si. All of this is possible with the compact benchtop system.
