Research flexibility without enterprise complexity
Thin-Film Deposition and Plasma Processing Systems
Compact and modular platforms for sputtering, evaporation, CVD, etching, annealing and advanced thin-film R&D workflows.
Benchtop Systems
nanoPVD-S10ACompact RF and DC magnetron sputtering for conductive and insulating materials.
nanoPVD-S10A-WAWide-area sputtering configuration for substrates up to 8 inches.
nanoPVD-T15AThermal and low-temperature evaporation for metals, organics and sensitive materials.
nanoPVD-ST15ACombined sputtering and thermal evaporation within one compact research platform.
nanoETCHCompact plasma etching systems for controlled low-damage processing, surface activation and device fabrication workflows.
nanoANNEALCompact annealing platform for thin-film materials, devices and controlled thermal process development.
nanoCVD-8GBench-top chemical vapour deposition systems for graphene, nanomaterials and advanced thin-film research.
MiniLab Series
MiniLab 026Compact modular thin-film platform for accessible multi-process research workflows.
MiniLab 070Advanced sputtering and evaporation platform for flexible thin-film process development.
MiniLab 080Thermal evaporation platform for optical coatings, organics and advanced materials research.
MiniLab 090Integrated thin-film process development platform for glovebox-compatible and advanced R&D workflows.
MiniLab 125High-capability multi-process platform for demanding thin-film research and pilot development.
Nanoparticle Source PVDDedicated nanoparticle deposition capability for advanced materials and functional coating research.
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