High-performance evaporation and magnetron sputtering techniques within one process chamber — all housed in a compact, modular package for benchtop location. Ultimate flexibility for research-grade thin-film deposition requiring a space-friendly footprint.
The latest model in Moorfield’s nanoPVD range, model ST15A has been purpose-designed to accommodate both vacuum evaporation and magnetron sputtering sources within the a single process chamber. Available source types are low-temperature evaporation (LTE), standard resistive evaporation, and magnetron sputtering (2″ targets) for deposition of organics, dielectrics, and metals.
Each process chamber can hold up to 3 sources of up to 2 types. A full range of power supplies are available allowing for deposition of multiple film types — metals, insulators, dielectrics and organics — using the same system and even within the same process run.
As with all nanoPVD tools, chamber access is via a hinged lid, that opens to reveal a stage suitable for holding substrates up to 4″/100 mm diameter. The chamber is tall, allowing for high-uniformity coating via fitted techniques.
The units are easy to control via a touchscreen HMI interface, simple to maintain, have low running costs and come with a comprehensive range of safety features.
With a turbomolecular pumping system, high-vacuum base pressures, straightforward automated control via a touchscreen HMI and a range of options for flexible configuration, the nanoPVD-ST15A combines the proven ease-of-use and high-end performance the nanoPVD range has become known for with ultimate applications flexibility.
Sputtering and metals evaporation
1 magnetron with RF power supply (metals and/or dielectrics) and SputterSwitch module for shared output, 2 thermal evaporation sources (metals) with single power supply and switch for shared output.
Automatic pressure control (Ar and O2 process gases), 500 °C substrate heating and quartz crystal sensor head for rate/thickness monitoring.
Sputtering and organics evaporation
2 magnetrons with DC power supply (metals) and SputterSwitch module for shared output, 1 low-temperature evaporation source (organics) with power supply.
Ar process gas, Z-shift and bi-shutter for best 4″ substrate geometries, quartz crystal sensor head for rate/thickness monitoring.
All nanoPVD-S10A systems require chilled water, dry compressed air, nitrogen for venting (optional), process gas supplies, and electrical power. Exact requirements will be provided with quotations or on request.
We’ve received your message and will be in touch soon