The nanoETCH implements Moorfield’s unique soft-etching technology and provides the fine etching control crucial for graphene and 2D materials research in a convenient, benchtop package.
As a result, and in contrast to conventional etching solutions, the tool enables high-performance for key applications in graphene and 2D materials:
- Substrate preparation for flake exfoliation: Large-area flakes through surface conditioning
- Clean material patterning: Graphene removal without resist residues
- Defect engineering: Creating defects in graphene layers
As standard, the system is suitable for accepting substrates up to 3″ diameter. A turbomolecular pumping system enables contamination-free operation. Substrates rest on a purpose-designed stage, and power is supplied from an RF unit engineered to allow for fine control at low powers. Together with carefully modelled in-chamber RF acoustics, this provides the tool with its unique capabilities.
The system can be connected to a PC for data-logging. The nanoETCH tool is now installed in leading graphene/2D material research labs, including ICFO (Spain), the Cambridge Graphene Centre and the UK National Graphene Institute.
