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Magnetron sputtering

In magnetron sputtering, magnetic fields focus plasmas onto target material surfaces, ejecting material that moves through the plasma to coat substrates. Suitable for depositing most materials (with correct choice of sputtering power supply).

Magnetron sputtering is a core speciality of Moorfield, with most of our systems offering this technique.

Moorfield systems for Magnetron sputtering:

MiniLab

The MiniLab range from Moorfield: Flexible, modular PVD systems for high-quality R&D and pilot-scale production.
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nanoPVD

A high-performance, high-vacuum PVD system in a compact package for benchtop location. Superior, efficient performance for a multitude of R&D thin-film deposition applications.
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nanoEM

The nanoEM system is the first electron microscopy coating tool with a full, research-grade feature set.
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Recent posts about Magnetron sputtering:

New dedicated sputter targets site launched

Due to steadily increasing demand, Moorfield have released a new standalone website just for sputter targets! As industry leaders in high-vacuum PVD, CVD, and
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Using recirculating chillers

Don’t land yourself in cold water. Protect your investment with a chiller
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Substrate adhesion of sputtered films

An introductory explanation of substrate adhesion, and how this can be improved.
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Sputtering magnetrons & targets from Moorfield

As well as complete sputtering systems, Moorfield sell a range of deposition components and consumables including magnetron sources and targets.
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Confocal magnetron sputtering

Confocal magnetron sputtering is now routinely employed for the production of excellent uniformity, multi-layer films by magnetron sputtering. This application note describes the technology,
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Moorfield’s nanoPVD range goes from strength to strength

Four recent installations in London, Sweden, and Norway
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