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Moorfield graphene soft-etching technology allows for the controlled removal of graphene and 2D materials, without cross-linking photoresists that can lead to residual contamination that affects device performance.
Moorfield Nanotechnology Limited (Knutsford, UK) recently announced the appointment of a new distributor for their PVD, CVD and etch products for the Australia and New Zealand region.
Moorfield will be at the RAMS 2017 conference at the University of Exeter. Come along to meet our expert sales engineers and to see demos of our benchtop nanoPVD (thin-film deposition) and nanoCVD (graphene synthesis) systems.
Macháč, P., et al. Journal of Electrical Engineering 2017 DOI: 10.1515/jee-2017-0011 The work reports the synthesis of few-layer graphene films at the interface of an SiO2 chip and a cobalt thin film. The cobalt layer decomposes methane feedstock, absorbs the carbon released at the SiO2/cobalt interface where it assembles into an sp2 layer. This approach […]
Macháč, P., et al. ElectroScope 2016 The paper demonstrates the production of graphene using the cold-walled method as implemented in the nanoCVD-8G. Link: http://18.104.22.168/index.php?option=com_content&view=article&id=468:graphene-growth-by-chemical-vapor-deposition-process-on-copper-foil&catid=59:2016-12-12-09-18-59&Itemid=56 Moorfield products: nanoCVD-8G
A simple process for the fabrication of large-area CVD graphene based devices via selective in situ functionalization and patterning
Alexeev, A. A., et al. 2D Materials 2016 DOI: 10.1088/2053-1583/4/1/011010 This paper reports a simple method for the production of functional devices from CVD graphene (produced using a nanoCVD-8G system). Rather than forming devices on the application substrate after transfer, the authors demonstrate material patterning on the copper growth substrate, using lithography and plasma oxidation, […]
Wagner, S. et al. Microelectronic Engineering 2016 DOI: 10.1016/j.mee.2016.02.065 In this work, graphene, fabricated using a Moorfield nanoCVD-8G system, was transferred onto pre-fabricated microcavity substrates using different methods. The devices were then investigated and analyzed with respect to yield and quality of the free-standing membranes on a large-scale. An effective transfer method for layer-by-layer stacking […]
Another month, another demo tour! This time, up to the north-east UK. Thanks to all who came along to live demonstrations of our nanoETCH and nanoCVD products for graphene and 2D materials. Next up: Further locations in Northern England and Scotland! (Please contact us if you’d like to book a visit…)
Gahoi, A. et al. Solid-State Electronics 2016 DOI: 10.1016/j.sse.2016.07.008 The contact resistance of various metals to chemical vapor deposited (CVD) monolayer graphene is investigated. The graphene was made using a Moorfield nanoCVD-8G system. The lowest value of 92 Ω μm is observed for the contact resistance between graphene and gold, extracted from back-gated devices at […]
Moorfield are planning their latest demo tour. This time we’ll be heading to the English West Country and South Wales. We’ll be bringing nanoETCH and nanoCVD systems with us, so if you’re in the area, available the week of 20th June and would like to see state-of-the-art graphene and 2D materials systems in action, let us […]
Moorfield are pleased to announce the latest model in their nanoCVD range, model nanoCVD-WPG. The nanoCVD-WPG is a wafer-scale, plasma-enhanced CVD system for graphene synthesis. With substrate stages up to 4″ diameter, multiple process gases, RF plasmas and easy manual or automatic operation, this state-of-the-art tool scales proven nanoCVD technology to another level. Contact us for more […]