Due to steadily increasing demand, Moorfield have released a new standalone website just for sputter targets! As industry leaders in high-vacuum PVD, CVD, and etch systems, we can offer a huge range of sputtering targets, as well as expert advice and guidance for your project. The new site showcases some of the most popular targets […]
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An introductory explanation of substrate adhesion, and how this can be improved.
As well as complete sputtering systems, Moorfield sell a range of deposition components and consumables including magnetron sources and targets.
Confocal magnetron sputtering is now routinely employed for the production of excellent uniformity, multi-layer films by magnetron sputtering. This application note describes the technology, and explains the principles behind it.
Four recent installations in London, Sweden, and Norway
Moorfield are experienced in all common PVD techniques and can supply systems with fully-integrated component sets. Standalone components also available.
Magnetron sputtering is a versatile technique suited to a wide range of materials – and provides excellent coating-substrate adhesion.
The basics of Vacuum Evaporation Low temperature evaporation is a recent development in the field of vacuum evaporation. Traditional vacuum evaporation methods work, essentially, by heating materials to high temperatures. This is required for common thin-film evaporants so that they are vapourised from a source. The evaporants then move up through a process chamber to […]
Thermal evaporation is the most straightforward physical vapour deposition (PVD) technique, in terms of both mechanism and system configuration. The method is suitable for depositing a range of materials, primarily metals.
Moorfield stock a range of high-vacuum magnetron sputtering heads for industry-standard diameter targets.
This June, Moorfield will be touring the Benelux territories with local representative ST Instruments. In the back of the van will be a working nanoPVD-S10A system!