Four recent installations in London, Sweden, and Norway
News from Moorfield
Moorfield are pleased to launch a new-look site
Moorfield are experienced in all common PVD techniques and can supply systems with fully-integrated component sets. Standalone components also available.
Magnetron sputtering is a versatile technique suited to a wide range of materials – and provides excellent coating-substrate adhesion.
The basics of Vacuum Evaporation Low temperature evaporation is a recent development in the field of vacuum evaporation. Traditional vacuum evaporation methods work, essentially, by
Thermal evaporation is the most straightforward physical vapour deposition (PVD) technique, in terms of both mechanism and system configuration. The method is suitable for depositing a range of materials, primarily metals.
Like all evaporative physical vapour deposition (PVD) methods, electron-beam evaporation (also known as e-beam evaporation) involves heating a material under vacuum conditions (typically in the 10-7 mbar region, or lower). This in-turn releases a vapour that moves up through a process chamber and coats a substrate at the top.
New Overview Video for our Physical Vapour Deposition (PVD) System
Moorfield have supplied and manufactured two UHV chambers which will form the core of a new system in the Surface, Interface & Thin Film Group at Warwick University
Moorfield stock a range of high-vacuum magnetron sputtering heads for industry-standard diameter targets.