Thermal Processing

Thermal processing

Complete thermal processing systems and bespoke components for high-temperature sample processing under controlled low-pressure, inert and reactive atmospheres.

ANNEAL

High-temperature vacuum annealing for planar substrates, up to 1000 °C, with precision gas and pressure control—all in a benchtop package.

Substrate adhesion of sputtered films

An introductory explanation of substrate adhesion, and how this can be improved.

Tools that fit like a glove

Research-grade vacuum deposition with inert sample handling

ICFO

ICFO – The Institute of Photonic Sciences is a research center devoted to the science and technology of light. Located in Castelldefels, Barcelona, Spain

University of Manchester

The University of Manchester is a public research university in Manchester, England, and is the largest university in the United Kingdom

Moorfield announces new product range: ANNEAL

Moorfield are pleased to announce their latest product range—ANNEAL systems for 2D materials research!

Contact resistance study of various metal electrodes with CVD graphene

Gahoi, A. et al. Solid-State Electronics 2016 DOI: 10.1016/j.sse.2016.07.008 The contact resistance of various metals to chemical vapor deposited (CVD) monolayer graphene is investigated.

Thermal Processing