Featured – Moorfield Nanotechnology

Fluorinated Gas Etching

This has allowed nanoETCH and MiniLab tools fitted with reactive ion etching (RIE) hardware to be used for removal of a wide range of materials far beyond those structured on carbon — for which the etching range was originally created more than 10 years ago. In recent times, we have worked with academic and industrial […]

First Nanoparticle Vacuum Deposition Tool Shipped

At Moorfield, we are constantly developing the capabilities of our research tools. This month saw the first installation of a MiniLab tool equipped with a nanoparticle vacuum deposition source.

Nanoparticle Vacuum Deposition Sources

At their heart, these sources consist of 1–3 magnetron sputtering sources. Material generated from these passes down an extended tube where it aggregates into nanoparticles of sizes 1–20 nm. At the end of the tube, the nanoparticles are ejected through an orifice into a process chamber where they coat a supported substrate. Applications of vacuum-deposited […]

Vacuum-Evaporated Inorganic Lead-Free Halide Films for Next-Generation Solar Cells

Inorganic Lead-Free Halide Materials

Thin Film Bragg Reflector for a Monolithic GaAs Device with Process-Optimised MiniLab PVD Systems

Deposition tools now available process-proven for coatings with specific optical properties

New Chinese distribution partner

Moorfield Nanotechnology have recently appointed a distributor in China for their PVD, CVD, and etch systems.

New dedicated sputter targets site launched

Due to steadily increasing demand, Moorfield have released a new standalone website just for sputter targets! As industry leaders in high-vacuum PVD, CVD, and etch systems, we can offer a huge range of sputtering targets, as well as expert advice and guidance for your project. The new site showcases some of the most popular targets […]