nanoCVD-8G

A benchtop graphene CVD system for rapid, on-demand synthesis of high-quality graphene. Fully automated cold-wall technology for reduced contamination and running costs, and enhanced conditions control.

Techniques:

Chemical vapour deposition (CVD)

Developed in collaboration with academic groups, the nanoCVD-8G is a graphene CVD system that provides precise control over conditions such as pressure, temperature and gas chemistry – critical for successful production of graphene.

The units implement the cold-wall variant of the CVD method, enabling reduced contamination, low running costs and better control as compared to tube-furnace counterparts.

User operation is via a touchscreen HMI and is recipe-based, with all hardware being fully automated. Comprehensive safety features protect users and the system itself. Included PC software enables data-logging and offline recipe definition. All units come with expert support.

Systems are quick to install and ideal for research groups requiring ongoing rapid access to high-quality graphene for R&D applications.

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    Key features

    • Ultra-compact, benchtop, CVD system
    • Reproducible synthesis of high-quality graphene
    • Precise control of conditions
    • 1100 °C maximum temperature
    • Process times <30 minutes
    • 20 × 40 mm2 maximum substrate size
    • Fully-automatic
    • User-friendly, touchscreen HMI operation
    • Define/save multiple growth recipes
    • PC connection for data-logging
    • Equipped for easy servicing
    • Comprehensive safety features
    • Cleanroom compatible
    • Proven performance

    Options

    • The nanoCVD-8G is available with a rotary or scroll (dry) backing pump.

    Typical configurations

    The nanoCVD-8G is a standardised system.

    Service requirements

    The nanoCVD-8G requires inert service gas, high-purity process gases (argon, hydrogen and methane) and electrical power.

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    nanoCVD-8G