Moorfield’s cutting edge deposition systems have enabled our R&D into state-of-the-art microelectronic devices since we received our first system in 2006. We now have multiple tools, including a combined magnetron sputtering and electron-beam evaporation cluster. We have been continuously impressed by their innovative, flexible designs and their rapid, expert support.
DR. MICHAEL COOKE
Plasma etching stages from Moorfield
Plasma etching is an excellent way to clean substrate surfaces, promote adhesion and optimise sample quality layers
