Fluorinated Gas Etching
This has allowed nanoETCH and MiniLab tools fitted with reactive ion etching (RIE) hardware to be used for removal of a wide range of materials far beyond those structured on carbon — for which the etching range was originally created more than 10 years ago. In recent times, we have worked with academic and industrial […]
Thin Film Bragg Reflector for a Monolithic GaAs Device with Process-Optimised MiniLab PVD Systems
Deposition tools now available process-proven for coatings with specific optical properties
MiniLab 080 Used to Develop “HexAuFoil” for Ultra-High Resolution cryo-EM
Cryo-EM is now widely used for imaging biological molecules but further advances in resolution that could yield enhanced structural data are impeded due to movement of water/ice layers that occur on exposure to electron beam irradiation
Load lock & fast entry chambers
A guide to available variations from Moorfield
