A benchtop, RF and DC magnetron sputtering system for metals and insulating materials. Compact as an electron microscopy coater, but with high-end hardware for research-grade results.
The nanoPVD-S10A is a magnetron sputtering system compact enough to be located benchtop, but that can be fitted with DC and/or RF power supplies for deposition of metals or insulating materials such as oxides or nitrides.
Magnetrons (up to 3 can be fitted) are water-cooled, allowing for high powers and sustained operation, and sized for accepting industry-standard targets. Units have turbomolecular pumping systems for low-contamination operation. Co-deposition is possible, as is reactive sputtering via the gas/pressure control module that can support up to 3 process gases.
Chamber access is via a hinged lid, that opens to reveal a stage suitable for holding substrates up to 4″ diameter.
The units are easy to control via a touchscreen HMI interface, simple to maintain, have low running costs and come with a comprehensive range of safety features.
All nanoPVD-S10A systems require chilled water, dry compressed air, nitrogen for venting (optional), process gas supplies, and electrical power.
Exact requirements will be provided with quotations or on request.
Recent posts related to this system:
Four recent installations in London, Sweden, and Norway Our nanoPVD
Jin, J., et al. Journal of Physics D: Applied Physics