nanoPVD-S10A

A benchtop, RF and DC magnetron sputtering system for metals and insulating materials. Compact as an electron microscopy coater, but with high-end hardware for research-grade results.
nanoPVD S10A
Techniques

The nanoPVD-S10A is a magnetron sputtering system compact enough to be located benchtop, but that can be fitted with DC and/or RF power supplies for deposition of metals or insulating materials such as oxides or nitrides.

Magnetrons (up to 3 can be fitted) are water-cooled, allowing for high powers and sustained operation, and sized for accepting industry-standard targets. Units have turbomolecular pumping systems for low-contamination operation. Co-deposition is possible, as is reactive sputtering via the gas/pressure control module that can support up to 3 process gases.

Chamber access is via a hinged lid, that opens to reveal a stage suitable for holding substrates up to 4″ diameter.

The units are easy to control via a touchscreen HMI interface, simple to maintain, have low running costs and come with a comprehensive range of safety features.

Download the nanoPVD-S10A product brochure
Key features
  • Benchtop configuration
  •  
  • Water-cooled magnetron sputtering sources for industry-standard 2″ targets
  •  
  • MFC-controlled process gases
  •  
  • DC and/or RF power supplies
  •  
  • Fully automatic operation via touchscreen HMI
  •  
  • Define/save multiple process recipes
  •  
  • Up to 4” diameter substrates
  •  
  • Base pressures <5 × 10-7 mbar
  •  
  • Equipped for easy servicing
  •  
  • Comprehensive safety features
  •  
  • Cleanroom compatible
  •  
  • Proven performance
  • Options
  • Dry backing pump
  •  
  • Fast chamber vent
  •  
  • Automatic high-resolution pressure control
  •  
  • Additional process gases
  •  
  • 500 °C substrate heating stage
  •  
  • Substrate rotation, Z-shift and shutters
  •  
  • Up to 3 magnetron sputtering sources
  •  
  • RF and/or DC power supplies
  •  
  • SputterSwitch power supply/source switching technology
  •  
  • Co-deposition
  •  
  • Quartz crystal sensor head
  • Typical configurations

    Metals deposition
    2 magnetrons with DC power supply and SputterSwitch module for shared output, substrate Z-shift and bi-shutter for best 4″ substrate geometries, quartz crystal sensor head for rate/thickness calibration.

    TCO/dielectrics sputtering
    2 magnetrons with RF power supply and SputterSwitch module for shared output, substrate heating and additional oxygen process gas line for enhanced film properties, substrate Z-shift and bi-shutter. Quartz crystal sensor head.

    Reactive/co-deposition
    3 magnetrons with RF and DC power supplies and SputterSwitch module for fully-flexible power supply/source routing. 3 process gases (argon, oxygen and nitrogen) for reactive deposition of oxides and nitrides.

    Service requirements

    All nanoPVD-S10A systems require chilled water, dry compressed air, nitrogen for venting (optional), process gas supplies, and electrical power. Exact requirements will be provided with quotations or on request.

    Get a quote for nanoPVD-S10A

    Thank you

    We’ve received your message and will be in touch soon

    Thank you for signing up