Research flexibility without enterprise complexity
Thin-Film Deposition and Plasma Processing Systems
Compact and modular platforms for sputtering, evaporation, CVD, etching, annealing and advanced thin-film R&D workflows.
Benchtop Systems
nanoPVD-S10ACompact RF and DC magnetron sputtering for conductive and insulating materials.
nanoPVD-S10A-WAWide-area sputtering configuration for substrates up to 8 inches.
nanoPVD-T15AThermal and low-temperature evaporation for metals, organics and sensitive materials.
nanoPVD-ST15ACombined sputtering and thermal evaporation within one compact research platform.
nanoETCHCompact plasma etching systems for controlled low-damage processing, surface activation and device fabrication workflows.
nanoANNEALCompact annealing platform for thin-film materials, devices and controlled thermal process development.
nanoCVD-8GBench-top chemical vapour deposition systems for graphene, nanomaterials and advanced thin-film research.
MiniLab Series
MiniLab 026Compact modular thin-film platform for accessible multi-process research workflows.
MiniLab 070Advanced sputtering and evaporation platform for flexible thin-film process development.
MiniLab 080Thermal evaporation platform for optical coatings, organics and advanced materials research.
MiniLab 090Integrated thin-film process development platform for glovebox-compatible and advanced R&D workflows.
MiniLab 125High-capability multi-process platform for demanding thin-film research and pilot development.
Nanoparticle Source PVDDedicated nanoparticle deposition capability for advanced materials and functional coating research.
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Use the selectorThin Film Deposition Systems
We offer advanced benchtop and modular thin film deposition systems with magnetron sputtering and thermal evaporations options. In addition our benchtop range of CVD, anneal and Etch systems offer exceptional performance with a compact footprint.
