MiniLab 125
Optimised for multi-technique applications, the MiniLab 125 is a modular magnetron sputtering and thermal evaporation PVD system for subrates up to 11″ diameter.
MiniLab 125 Modular PVD System
Optimised for multi-technique applications, a modular magnetron sputtering and thermal evaporation PVD system for substrates up to 11″ diameter.
Deposition sources are typically mounted on the chamber baseplate, but sputter-down configurations are also available.
Substrate stages, usually at the top of the chamber, can accommodate substrate sizes up to 11” diameter. Substrate heating, rotation, bias and Z-shift are available, together with planetary stages and source and substrate shutters. Configurations range from a manually operated thermal evaporation system up to a multi-technique tool with fully-automated process control.
Key features
- Modular design
- Turbomolecular or cryo-pumping systems
- Base pressures <5 × 10-7 mbar
- Metals, dielectrics and organics deposition
- Up to 11” diameter substrates
- Touchscreen HMI/PC for system control
- Equipped for easy servicing
- Comprehensive safety features and interlocks
- Cleanroom compatible
Options
- Pumping: Turbomolecular or cryogenic high-vacuum pumps, rotary or scroll backing pumps
- Gas/pressure: Manual or automatic control via MFCs and throttle valves
- Load-locks: Single- and multiple-sample
- Stages: Rotation, heating, cooling, Z-shift, bias and planetary
- Shutters: Source and substrate, pneumatic or motorised
- Operation: Manual or automatic via front panels, touchscreen HMI or PC
- Process: Quartz crystal sensor heads for rate/thickness monitoring or feedback-loop control
Example Configurations
