nanoPVD-T15A
The nanoPVD-T15A is a benchtop evaporation system optimised for deposition of various high-melting point metals and volatile organics. As compact as an electron microscopy coater, but with high-end hardware for research-grade results.
The nanoPVD-T15A is optimised for thermal evaporation onto substrates up to 4″ diameter. It can be equipped with standard resistive evaporation sources and/or low-temperature evaporation (LTE) sources for deposition of metals and organics, respectively.
LTE sources are low thermal-mass for better control when evaporating volatile organic materials, while metals sources are our box-shielded TE1 models for efficient deposition and reduced cross-contamination.
Chamber access is via a hinged lid, that opens to reveal a stage suitable for holding substrates up to 4″ diameter. The chamber is tall, allowing for high-uniformity coating via evaporative techniques.
The units are easy to control via a touchscreen HMI interface, simple to maintain, have low running costs and come with a comprehensive range of safety features.
With a turbomolecular pumping system, high-vacuum base pressures, straightforward automated control via a touchscreen HMI and a range of options for flexible configuration, the nanoPVD-T15A is a versatile, efficient solution for world-class R&D applications.
Options
- Dry backing pump
- Fast chamber vent
- Up to 4 LTE sources for organics
- Up to 2 evaporation sources for metals
- 500°C substrate heating stage
- Substrate rotation, Z-shift and shutters
- Quartz crystal sensor head
Key features
- Benchtop configuration
- Organics and metals evaporation sources
- High aspect-ratio chamber for uniform coating
- Fully automatic operation via touchscreen HMI
- Define/save multiple process recipes
- Up to 4” diameter substrates
- Base pressures <5 × 10-7 mbar
- Equipped for easy servicing
- Comprehensive safety features
- Proven performance
Typical configurations
Metals deposition:
Two thermal evaporation sources for metals evaporation with shutters and quartz crystal sensor head for rate/thickness calibration.
Organics deposition:
Four LTE sources for organics deposition with shutters and quartz crystal sensor head for rate/thickness calibration.
Metals and organics deposition:
Two thermal evaporation sources and two LTE sources for metals and organics PVD, with shutters and quartz crystal sensor head.
Service requirements
All nanoPVD-T15A systems require chilled water, dry compressed air, nitrogen for venting (optional), and electrical power. Exact requirements will be provided with quotations or on request.