Skip to content

PVD, CVD and Etch Systems

PVD, CVD and Etch Systems

Menu
Menu

nanoCVD-8G

The nanoCVD-8G is a graphene CVD system that provides precise control over conditions such as pressure, temperature and gas chemistry – critical for successful production of graphene.

nanoCVD-8G benchtop graphene synthesis

Developed in collaboration with academic groups, the nanoCVD-8G is a graphene CVD system that provides precise control over conditions such as pressure, temperature and gas chemistry – critical for successful production of graphene.

The units implement the cold-wall variant of the CVD method, enabling reduced contamination, low running costs and better control as compared to tube-furnace counterparts.

User operation is via a touchscreen HMI and is recipe-based, with all hardware being fully automated. Comprehensive safety features protect users and the system itself. Included PC software enables data-logging and offline recipe definition. All units come with expert support.

Systems are quick to install and ideal for research groups requiring ongoing rapid access to high-quality graphene for R&D applications.

Key features
  • Ultra-compact, benchtop, CVD system
  • Reproducible synthesis of high-quality graphene
  • Precise control of conditions
  • 1100 °C maximum temperature
  • Process times <30 minutes
  • 20 × 40 mm2 maximum substrate size
  • Fully-automatic
  • User-friendly, touchscreen HMI operation
  • Define/save multiple growth recipes
  • PC connection for data-logging
  • Equipped for easy servicing
  • Comprehensive safety features
  • Cleanroom compatible
  • Proven performance