nanoPVD-ST15A benchtop PVD system
High-performance evaporation and magnetron sputtering techniques within one process chamber — all housed in a compact, modular package for benchtop deposition onto substrates of up to 4″ diameter. The nanoPVD-ST15A provides the ultimate flexibility for research-grade thin-film deposition requiring a space-friendly footprint.
ThenanoPVD-ST15A has been purpose-designed to accommodate both vacuum evaporation and magnetron sputtering sources within a single process chamber. Available source types are low-temperature evaporation (LTE), standard resistive evaporation, and magnetron sputtering (2″ targets) for deposition of organics, dielectrics, and metals.
Each process chamber can hold up to 3 sources of up to 2 types. A full range of power supplies are available allowing for deposition of multiple film types — metals, insulators, dielectrics and organics — using the same system and even within the same process run.
As with all nanoPVD tools, chamber access is via a hinged lid, that opens to reveal a stage suitable for holding substrates up to 4″ diameter. The chamber is tall, allowing for high-uniformity coating via fitted techniques.
The units are easy to control via a touchscreen HMI interface, simple to maintain, have low running costs and come with a comprehensive range of safety features.
With a turbomolecular pumping system, high-vacuum base pressures, straightforward automated control via a touchscreen HMI and a range of options for flexible configuration, the nanoPVD-ST15A combines the proven ease-of-use and high-end performance the nanoPVD range has become known for with ultimate applications flexibility.
Options
- Dry backing pump
- Fast chamber vent
- Automatic high-resolution pressure control
- Additional process gases
- 500 °C substrate heating stage
- Substrate rotation, Z-shift and shutters
- Up to 3 magnetron sputtering sources
- RF and/or DC power supplies
- High temperature thermal evaporation sources
- Low temperature thermal evaporation sources
- SputterSwitch power supply/source switching technology
- Co-deposition
- Quartz crystal sensor head
Key features
- Benchtop configuration
- Water-cooled magnetron sputtering sources for industry-standard 2″ targets
- MFC-controlled process gases
- DC and/or RF power supplies
- Fully automatic operation via touchscreen HMI
- Define/save multiple process recipes
- Up to 4” diameter substrates
- Base pressures <5 × 10-7 mbar
- Equipped for easy servicing
- Comprehensive safety features
- Cleanroom compatible
- Proven performance
Typical configurations
Sputtering and metals evaporation
1 magnetron with RF power supply (metals and/or dielectrics), 2 thermal evaporation sources (metals) with single power supply and switch for shared output.
Automatic pressure control (Ar and O2 process gases), 500 °C substrate heating and quartz crystal sensor head for rate/thickness monitoring.
Sputtering and organics evaporation
2 magnetrons with DC power supply (metals) and SputterSwitch module for shared output, 1 low-temperature evaporation source (organics) with power supply.
Ar process gas, Z-shift and bi-shutter for best 4″ substrate geometries, quartz crystal sensor head for rate/thickness monitoring.
Service requirements
All nanoPVD-ST15A systems require chilled water, dry compressed air, nitrogen for venting (optional), process gas supplies, and electrical power. Exact requirements will be provided with quotations or on request.