nanoPVD-S10A
The nanoPVD-S10 is a benchtop system optimised for RF and DC magnetron sputtering of metals and insulating materials. As compact as an electron microscopy coater, but with high-end hardware for research-grade results.
nanoPVD-S10A Benchtop PVD System
Optimised for magnetron sputtering for substrates up to 4″ diameter. Compatible with DC and/or RF power supplies for deposition of metals or insulating materials such as oxides or nitrides.
Magnetrons (up to 3 can be fitted) are water-cooled, allowing for high powers and sustained operation, and sized for accepting industry-standard targets. Units have turbomolecular pumping systems for low-contamination operation. Co-deposition is possible, as is reactive sputtering via the gas/pressure control module that can support up to 3 process gases.
Chamber access is via a hinged lid, that opens to reveal a stage suitable for holding substrates up to 4″ diameter.
The units are easy to control via a touchscreen interface, simple to maintain, have low running costs and come with a comprehensive range of safety features.
Key features
- Benchtop configuration
- Water-cooled magnetron sputtering sources for industry-standard 2″ targets
- Process gas introduction via Mass Flow Controllers
- DC and/or RF power supplies
- Fully automatic operation via touchscreen HMI
- Define/save multiple process recipes
- Up to 4” diameter substrates
- Base pressures <5E-07 mbar
- Equipped for easy servicing
- Comprehensive safety features
- Cleanroom compatible
- Proven performance
Example Publications
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- Dry backing pump
- Fast chamber vent
- Automatic high-resolution pressure control
- Additional process gases
- Stage heating to 500 °C
- Substrate rotation, Z-shift and shutters
- Up to 3 magnetron sputtering sources
- RF and/or DC power supplies
- SputterSwitch power supply/source switching technology
- Co-deposition
- In-situ rate and thickness monitoring
Typical configurations
Metals deposition:
2 magnetrons with DC power supply and SputterSwitch module for shared output, substrate Z-shift and bi-shutter for best 4″ substrate geometries, quartz crystal sensor head for rate/thickness calibration.
TCO/dielectrics sputtering:
2 magnetrons with RF power supply and SputterSwitch module for shared output, substrate heating and additional oxygen process gas line for enhanced film properties, substrate Z-shift and bi-shutter. Quartz crystal sensor head.
Reactive/co-deposition:
3 magnetrons with RF and DC power supplies and SputterSwitch module for fully-flexible power supply/source routing. 3 process gases (argon, oxygen and nitrogen) for reactive deposition of oxides and nitrides.
Service requirements
All nanoPVD-S10A systems require chilled water, dry compressed air, nitrogen for venting (optional), process gas supplies, and electrical power. Exact requirements will be provided with quotations or on request.
Protect your investment and maximise uptime
Your Moorfield system is a long-term asset that needs to operate reliably and repeatably. A Service Plan is designed to protect your investment by reducing unplanned downtime, improving system reliability, and giving your team faster access to expert support when you need it.
All plans include an annual preventive maintenance visit (with documented checks) plus remote technical support—helpful for troubleshooting issues quickly without waiting for an on-site visit. As your needs increase, higher tiers add greater consumables/parts cover, discounted call-outs and travel, priority scheduling, and training refresher days to help new users get up to speed and reduce avoidable errors.
Service Plans also support easier budgeting (fixed annual or monthly options on eligible tiers) and provide multi-system discounts.
Ask us which plan best fits your throughput demands and budget priorities using our CONTACT US FORM