MiniLab 080
MiniLab 080 systems offer tall chambers ideally suited for thermal, LTE and e-beam evaporation techniques requiring longer working distances for optimum uniformity.

MiniLab 080 Modular PVD System
The MiniLab080 offer tall chambers ideally suited for thermal, LTE and e-beam evaporation techniques requiring longer working distances for optimum uniformity.
The tools are ideally suited to evaporation techniques where long working distances are required for best uniformity, and where evaporant incident angles close to 90° allow for optimal results for lift-off applications. However, as well as thermal, LTE and e-beam evaporation, the tools can also be fitted for magnetron sputtering (commonly as a multi-technique system).
Substrate stages, usually at the top of the chamber, can accommodate substrate sizes up to 11” diameter. Substrate heating, rotation, bias and Z-shift are available, together with planetary stages and source and substrate shutters. Configurations range from a manually operated thermal evaporation system up to a multi-technique tool with fully-automated process control.
Key features
- Modular design
- Front-loading D-shaped vacuum chamber
- Turbomolecular and cryo pumping systems
- Base pressures <5 × 10-7 mbar
- Metals, dielectrics and organics deposition
- Up to 11” diameter substrates
- Up to 6 sources
- Touchscreen HMI/PC for system control
- Equipped for easy servicing
- Comprehensive safety features and interlocks
- Cleanroom compatible
- Load-locks available
Example MiniLab Publications
Options
- Pumping: Turbomolecular or cryogenic high-vacuum pumps, rotary or scroll backing pumps
- Gas/pressure: Manual or automatic control via MFCs and throttle valves
- Load-locks: Single- and multiple-sample
- Stages: Rotation, heating, cooling, Z-shift, bias and planetary
- Shutters: Source and substrate, pneumatic or motorised
- Operation: Manual or automatic via front panels, touchscreen HMI or PC
- Process: Quartz crystal sensor heads for rate/thickness monitoring or feedback-loop control