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Advanced Modular Evaporation System

MiniLab 080 Modular Evaporation System

Advanced evaporation platform for thermal, organic and e-beam thin-film process development.

MiniLab 080 is strongest when evaporation flexibility is the deciding factor: thermal sources, organic/LTE methods, e-beam options and monitoring in one modular research platform.

ProcessThermal + e-beam
MonitoringQCM options
PlatformModular MiniLab
MiniLab 080 modular evaporation system
MiniLab 080 modular evaporation system

Research-grade capability without enterprise complexity

This platform is positioned for research teams that need controllable thin-film process access, practical laboratory integration and clear configuration choices.

  • Evaporation-first modular platform for research workflows
  • Thermal, organic/LTE and e-beam methods by configuration
  • QCM monitoring options for rate and thickness control
  • Stage heating, cooling and rotation options
  • Useful for optics, organics, sensors and coatings research

Typical configurations

Use these examples as starting points. Moorfield can refine the final specification around your materials, substrates, gases, recipes and workflow constraints.

Thermal evaporation R&D

For metals, interfaces and optical coating development.

  • Thermal source options
  • QCM monitoring
  • Repeatable recipe workflows

Organic and LTE workflows

For sensitive and volatile materials needing controlled source configurations.

  • LTE/organic options
  • Low-rate process development
  • Device and interface research

E-beam evaporation

For materials requiring high-temperature evaporation capability.

  • E-beam options
  • Monitoring and control
  • Advanced thin-film materials

Not sure which configuration is right for your research?

Discuss Your Application

Key features

Modular research architecture

Configure sources, chambers, stages and monitoring around the research programme.

Multi-technique capability

Combine sputtering, evaporation, e-beam and specialist process modules where required.

Advanced process control

Support for recipe-led workflows, monitoring, gas handling and advanced power options.

Scalable laboratory integration

Move beyond benchtop limits without defaulting to production-scale complexity.

Application-specific options

Glovebox, load-lock, bias, heating and diagnostic options can be specified by project.

Long-term adaptability

The system can be configured and expanded as research priorities evolve.

Options and upgrades

Configure the platform around the process approach, substrate handling, automation and laboratory services your application needs. Options are confirmed with quotation for the final build.

Vacuum and transfer

  • Optional Load Lock (up to 8″ substrates)
  • Transfer automation
  • Dual chamber option
  • Dry pumping options
  • Process gas expansion
  • Chamber cooling

Sources and power

  • Magnetron sputtering by configuration
  • Telemark 246-6 e-beam evaporation
  • TE1 + LTE thermal evaporation sources
  • HiPIMS / pulsed DC option
  • Ion Beam Source

Control and substrate handling

  • PC + IntelliDep control architecture
  • Substrate heating up to 800°C with SSIC heater
  • RF + DC substrate bias
  • QCM rate/thickness monitoring
  • Cooling, tilt, planetary stage and masking options
  • Substrate cooling

Technical specifications

Exact specifications depend on final configuration and should be confirmed with quotation.

System typeMiniLab modular PVD
Base pressure (HV)Confirm with Moorfield for this configuration
SputteringAvailable by configuration
E-beam evaporationTelemark 246-6
Thermal / LTE evaporationTE1 + LTE sources available
HiPIMS / pulsed DCAvailable; HiPSTER 1 + Pinnacle 1.5 kW power supply option
Maximum substrate size8" (200 mm)
Substrate heatingUp to 800°C with SSIC heater
Substrate biasRF + DC bias
Load lockOptional Load Lock (up to 8″ substrates)
Glovebox compatibleNot compatible
Dual chamberAvailable
Control softwarePC + IntelliDep software
Rate / thickness monitoringUp to 4 x water-cooled QCM + optional SQC-310 controller
Chamber materialStainless steel; enables CF flanges
Warranty2 years

Applications

Application-library examples where MiniLab 080 is cited in published solar-cell, sensing, cryo-EM support-grid and nanoscale imaging workflows.

Build the right MiniLab 080 configuration for your research

Tell us about your materials, substrates, process gases and target films. Moorfield will help specify a practical system configuration.

MiniLab 080

MiniLab 080 systems offer tall chambers ideally suited for thermal, LTE and e-beam evaporation techniques requiring longer working distances for optimum uniformity.

Modular PVD thin film deposition system optimised for thermal evaporation

MiniLab 080 Modular PVD System

The MiniLab080 offer tall chambers ideally suited for thermal, LTE and e-beam evaporation techniques requiring longer working distances for optimum uniformity.

The tools are ideally suited to evaporation techniques where long working distances are required for best uniformity, and where evaporant incident angles close to 90° allow for optimal results for lift-off applications. However, as well as thermal, LTE and e-beam evaporation, the tools can also be fitted for magnetron sputtering (commonly as a multi-technique system).

Substrate stages, usually at the top of the chamber, can accommodate substrate sizes up to 11” diameter. Substrate heating, rotation, bias and Z-shift are available, together with planetary stages and source and substrate shutters. Configurations range from a manually operated thermal evaporation system up to a multi-technique tool with fully-automated process control.

Key features
  • Modular design
  • Front-loading D-shaped vacuum chamber
  • Turbomolecular and cryo pumping systems
  • Base pressures <5 × 10-7 mbar
  • Metals, dielectrics and organics deposition
  • Up to 11” diameter substrates
  • Up to 6 sources
  • Touchscreen HMI/PC for system control
  • Equipped for easy servicing
  • Comprehensive safety features and interlocks
  • Cleanroom compatible
  • Load-locks available
Example MiniLab Publications
Options
  • Pumping: Turbomolecular or cryogenic high-vacuum pumps, rotary or scroll backing pumps
  • Gas/pressure: Manual or automatic control via MFCs and throttle valves
  • Load-locks: Single- and multiple-sample
  • Stages: Rotation, heating, cooling, Z-shift, bias and planetary
  • Shutters: Source and substrate, pneumatic or motorised
  • Operation: Manual or automatic via front panels, touchscreen HMI or PC
  • Process: Quartz crystal sensor heads for rate/thickness monitoring or feedback-loop control
Example Configurations
System Images
Protect your investment and maximise uptime

Your Moorfield system is a long-term asset that needs to operate reliably and repeatably. A Service Plan is designed to protect your investment by reducing unplanned downtime, improving system reliability, and giving your team faster access to expert support when you need it.

All plans include an annual preventive maintenance visit (with documented checks) plus remote technical support—helpful for troubleshooting issues quickly without waiting for an on-site visit. As your needs increase, higher tiers add greater consumables/parts cover, discounted call-outs and travel, priority scheduling, and training refresher days to help new users get up to speed and reduce avoidable errors.

Service Plans also support easier budgeting (fixed annual or monthly options on eligible tiers) and provide multi-system discounts.

Ask us which plan best fits your throughput demands and budget priorities using our CONTACT US FORM