Advanced Modular Sputtering System
MiniLab 070 Modular Sputtering System
Advanced modular sputtering for multi-source thin-film R&D.
MiniLab 070 is the MiniLab sputtering workhorse for research teams needing more sources, larger substrates, process gases, bias, QCM monitoring and advanced power options.
Research-grade capability without enterprise complexity
This platform is positioned for research teams that need controllable thin-film process access, practical laboratory integration and clear configuration choices.
- Multi-source sputtering capability for advanced research
- RF, DC, pulsed DC and HiPIMS options by configuration
- QCM monitoring and process-control options
- Modular platform for evolving research programmes
Typical configurations
Use these examples as starting points. Moorfield can refine the final specification around your materials, substrates, gases, recipes and workflow constraints.
Multi-source sputtering
For research teams developing multilayers, alloys and functional coatings.
- 4 x 3 inch source capability
- Reactive gas options
- Sequential and co-deposition workflows
Advanced power development
For projects that need more than standard DC or RF sputtering.
- HiPIMS and pulsed DC options
- Bias and monitoring options
- Process development flexibility
Larger substrate R&D
For thin-film development beyond benchtop substrate limits.
- Up to 8 inch (200 mm) substrate positioning
- MiniLab platform scale
- Research-first configuration
Not sure which configuration is right for your research?
Discuss Your ApplicationKey features
Modular research architecture
Configure sources, chambers, stages and monitoring around the research programme.
Multi-technique capability
Combine sputtering, evaporation, e-beam and specialist process modules where required.
Advanced process control
Support for recipe-led workflows, monitoring, gas handling and advanced power options.
Scalable laboratory integration
Move beyond benchtop limits without defaulting to production-scale complexity.
Application-specific options
Glovebox, load-lock, bias, heating and diagnostic options can be specified by project.
Long-term adaptability
The system can be configured and expanded as research priorities evolve.
Options and upgrades
Configure the platform around the process approach, substrate handling, automation and laboratory services your application needs. Options are confirmed with quotation for the final build.
Technical specifications
Exact specifications depend on final configuration and should be confirmed with quotation.
| System type | MiniLab modular PVD |
|---|---|
| Base pressure (HV) | 5×10-7 mbar |
| Max sputter sources | 4 x 3″ |
| E-beam evaporation | Telemark 246 |
| Thermal / LTE evaporation | TE1 + LTE sources available |
| HiPIMS / pulsed DC | Available; HiPSTER 1 + Pinnacle 1.5 kW power supply option |
| Maximum substrate size | 8″ (200 mm) |
| Substrate heating | Up to 800°C with SSIC heater |
| Substrate bias | RF + DC bias |
| Load lock | Optional Load Lock (up to 8″ substrates) |
| Glovebox compatible | Not compatible |
| Dual chamber | Available |
| Control software | PC + IntelliDep software |
| Rate / thickness monitoring | Up to 4 x water-cooled QCM + optional SQC-310 controller |
| Chamber material | Stainless steel; enables CF flanges |
| Warranty | 2 years |
Applications
MiniLab family application-library examples for modular thin-film workflows, sensors, optical structures and process-development examples.
High-Efficiency Semitransparent Solar Cells
Publication Title: High‐Efficiency Semitransparent Solar Cells Based on Magnetron Sputtered Sb 2 S 3 Thin Films
Lead facility: Luleå University of Technology
Moorfield product cited: MiniLab 070
Read applicationTransmissive Hybrid Metal-Dielectric
Publication Title: Transmissive hybrid metal–dielectric metasurface bandpass filters for mid‐infrared applications
Lead facility: University of Cambridge
Moorfield product cited: MiniLab 070
Read applicationDirect synthesis of nanopatterned graphene
Publication Title: Direct synthesis of nanopatterned epitaxial graphene on silicon carbide
Lead facility: University of Technology Sydney
Moorfield product cited: nanoPVD-S10A
Read applicationDirect Single-Molecule Detection in Super Resolution
Publication Title: Direct single-molecule detection and super-resolution imaging with a low-cost portable smartphone-based microscope
Lead facility: University of Fribourg
Moorfield product cited: MiniLab 080
Read applicationEffect of Pt coating on electrochemical behaviour
Publication Title: Engineering Cu 2 O Nanowire Surfaces for Photoelectrochemical Hydrogen Evolution Reaction
Lead facility: Luleå University of Technology
Moorfield product cited: MiniLab 070
Read applicationThin Film Bragg Reflector for Monolithic GaAs Devices
Publication Title: Thin Film Bragg Reflector for Monolithic GaAs Devices
Lead facility: Not stated in publication metadata
Moorfield product cited: MiniLab 125
Read applicationResources and next steps
Related systems
Build the right MiniLab 070 configuration for your research
Tell us about your materials, substrates, process gases and target films. Moorfield will help specify a practical system configuration.
MiniLab 070
MiniLab 070 PVD systems have front-loading box-type chambers and are optimised for magnetron sputtering for substates up to 11″ diameter.
MiniLab 070 Modular PVD System
Optimised for magnetron sputtering for substrates up to 11″ diameter. The vacuum chamber sits on a double-rack frame that contains all system control electronics and power supplies.
Deposition sources are typically mounted on the chamber baseplate, but sputter-down configurations are also available.
Substrate stages, usually at the top of the chamber, can accommodate substrate sizes up to 11” diameter. Substrate heating, rotation, bias and Z-shift are available, together with planetary stages and source and substrate shutters. Configurations range from a manually operated thermal evaporation system up to a multi-technique tool with fully automated process control.
Key features
- Modular design
- Front-loading box-type vacuum chamber
- Turbomolecular and cryo pumping systems
- Base pressures <5 × 10-7 mbar
- Metals, dielectrics and organics deposition
- Up to 11” diameter substrates
- Up to 4 sources
- Touchscreen HMI/PC for system control
- Equipped for easy servicing
- Comprehensive safety features and interlocks
- Cleanroom compatible
- Load-locks available
Example MiniLab Publications
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- Pumping: Turbomolecular or cryogenic high-vacuum pumps, rotary or scroll backing pumps.
- Gas/pressure: Manual or automatic control via MFCs and throttle valves.
- Load-locks: Single- and multiple-sample.
- Stages: Rotation, heating, cooling, Z-shift, bias and planetary.
- Shutters: Source and substrate, pneumatic or motorised
- Operation: Manual or automatic via front panels, touchscreen HMI or PC.
- Process: Quartz crystal sensor heads for rate/thickness monitoring or feedback-loop control.
Example Configurations
System Images
Protect your investment and maximise uptime
Your Moorfield system is a long-term asset that needs to operate reliably and repeatably. A Service Plan is designed to protect your investment by reducing unplanned downtime, improving system reliability, and giving your team faster access to expert support when you need it.
All plans include an annual preventive maintenance visit (with documented checks) plus remote technical support—helpful for troubleshooting issues quickly without waiting for an on-site visit. As your needs increase, higher tiers add greater consumables/parts cover, discounted call-outs and travel, priority scheduling, and training refresher days to help new users get up to speed and reduce avoidable errors.
Service Plans also support easier budgeting (fixed annual or monthly options on eligible tiers) and provide multi-system discounts.
Ask us which plan best fits your throughput demands and budget priorities using our CONTACT US FORM