Research Flexibility Without Enterprise Complexity
Benchtop Systems for Thin-Film, Anneal & Etch Research
Compact deposition, annealing and plasma processing systems designed for advanced materials research, semiconductor development and next-generation thin-film applications.
Built around flexible research workflows
Moorfield platforms are designed for universities, R&D facilities and pilot-scale innovation teams that need advanced process capability without enterprise-scale infrastructure complexity.
Benchtop Systems
Compact Moorfield platforms for research teams that need local access to thin-film deposition, thermal processing and plasma etch capability.
nanoPVD
SputteringnanoPVD-S10A
Compact RF and DC magnetron sputtering for conductive and insulating materials.
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Wide-area sputteringnanoPVD-S10A-WA
Wide-area sputtering configuration for larger research substrates and coating areas.
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EvaporationnanoPVD-T15A
Thermal and low-temperature evaporation for metals, organics and sensitive materials.
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Combined PVDnanoPVD-ST15A
Combined sputtering and thermal evaporation within one compact research platform.
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Key benefits
Compact Research Infrastructure
Reduce laboratory space and facility requirements.
Flexible Process Development
Support sputtering, thermal evaporation and multi-layer deposition workflows.
Faster Experimental Iteration
Optimised for process development rather than production-only operation.
Lower Total Cost of Ownership
Advanced deposition capability without large-scale manufacturing infrastructure.
Applications
Semiconductor thin films
Optical coatings
Thin-film batteries
Nanomaterials
Surface engineering
MEMS
Quantum materials
Functional coatings
Published work citing nanoPVD systems
Citations indexed independently by Bioz across the nanoPVD range. nanoETCH and nanoANNEAL, also shown on this page, are not included. Moorfield does not select, rank or edit these results.
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