Skip to content

PVD, CVD and Etch Systems

PVD, CVD and Etch Systems

Menu
Menu

nanoPVD-S10A-WA

Optimised for magnetron sputtering, the nanoPVD-S10A-WA is a Wide-Area configuration that extends the capabilities of the nanoPVD-S10A to allow for even coating of substrate diameters up to 8″, in a benchtop package.

nanoPVD-S10A-WA Benchtop PVD System

The wide-area version of the nanoPVD-S10A contains magnetron sputtering sources oriented directly upwards towards substrate platens. This arrangement in combination with substrate rotation and exposure plates with specially designed orifices allows for coating of substrates up to 8″ diameter for applications in which tight uniformity specifications are not critical.

Like the nanoPVD-S10A, magnetrons are water-cooled for sustained high-power operation and accept industry-standard targets. In addition, nanoPVD-S10A-WA units come with all attractive features of the nanoPVD range including turbomolecular pumping systems, recipe-based automated operation via touchscreen HMIs, and compact designs for benchtop location.

Options
  • Dry backing pump
  • Fast chamber vent
  • Automatic high-resolution pressure control
  • Additional process gases
  • 500 °C substrate heating stage
  • Substrate rotation, Z-shift and shutters
  • Up to 2 magnetron sputtering sources
  • RF and/or DC power supplies
  • SputterSwitch power supply/source switching technology
  • Co-deposition
  • Quartz crystal sensor head
Key features
  • Benchtop configuration
  • Water-cooled magnetron sputtering sources for industry-standard 2″ targets
  • MFC-controlled process gases
  • DC and/or RF power supplies
  • Fully automatic operation via touchscreen HMI
  • Define/save multiple process recipes
  • Up to 8” diameter substrates
  • Base pressures <5 × 10-7 mbar
  • Equipped for easy servicing
  • Comprehensive safety features
  • Cleanroom compatible
  • Proven performance
Typical configurations

The nanoPVD-S10-WA is a semi-custom tool, with final design being subject to customer requirements.

Service requirements

All nanoPVD-S10A systems require chilled water, dry compressed air, nitrogen for venting (optional), process gas supplies, and electrical power. Exact requirements will be provided with quotations or on request.