Research Flexibility Without Enterprise Complexity
Benchtop Systems for Thin-Film, Anneal & Etch Research
Compact deposition, annealing and plasma processing systems designed for advanced materials research, semiconductor development and next-generation thin-film applications.
Built around flexible research workflows
Moorfield platforms are designed for universities, R&D facilities and pilot-scale innovation teams that need advanced process capability without enterprise-scale infrastructure complexity.
Benchtop Systems
Compact Moorfield platforms for research teams that need local access to thin-film deposition, thermal processing and plasma etch capability.
nanoPVD
SputteringnanoPVD-S10A
Compact RF and DC magnetron sputtering for conductive and insulating materials.
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Wide-area sputteringnanoPVD-S10A-WA
Wide-area sputtering configuration for larger research substrates and coating areas.
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EvaporationnanoPVD-T15A
Thermal and low-temperature evaporation for metals, organics and sensitive materials.
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Combined PVDnanoPVD-ST15A
Combined sputtering and thermal evaporation within one compact research platform.
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Key benefits
Compact Research Infrastructure
Reduce laboratory space and facility requirements.
Flexible Process Development
Support sputtering, thermal evaporation and multi-layer deposition workflows.
Faster Experimental Iteration
Optimised for process development rather than production-only operation.
Lower Total Cost of Ownership
Advanced deposition capability without large-scale manufacturing infrastructure.
Applications
Semiconductor thin films
Optical coatings
Thin-film batteries
Nanomaterials
Surface engineering
MEMS
Quantum materials
Functional coatings
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