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Research flexibility without enterprise complexity

Benchtop Systems for Thin-Film, Anneal and Etch Research

Compact deposition, annealing and plasma processing systems designed for advanced materials research, semiconductor development and next-generation thin-film applications.

Moorfield benchtop thin-film system

Built around flexible research workflows

Moorfield benchtop systems give universities, R&D facilities and pilot-scale innovation teams local access to deposition, annealing and plasma process capability without enterprise-scale infrastructure complexity.

Key benefits

Compact research infrastructure

Reduce laboratory space and facility requirements while keeping process access close to the research team.

Flexible process development

Support sputtering, evaporation, thermal treatment and plasma preparation workflows across the benchtop range.

Faster experimental iteration

Optimised for process development and repeatable small-batch experimentation rather than production-only operation.

Lower operational friction

Add specialist capability locally before moving mature work to larger shared facilities or scale-up platforms.

Applications

Semiconductor thin films

Optical coatings

Thin-film batteries

Nanomaterials

Surface engineering

MEMS

Quantum materials

Functional coatings

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Benchtop PVD Systems

We offer advanced benchtop PVD systems for precise thin-film deposition. Our PVD systems including the nanoPVD-S10A optimised for magnetron sputtering, nanoPVD-T15A optimised for thermal evaporation and nanoPVD-ST15A for both techniques, are compact and ideal for research labs. Despite the compact footprint they deliver high-quality coatings of metals, dielectrics, and semiconductors. Designed for ease of use and versatility, our systems are perfect for nanotechnology and material science applications.

View some of the publications that cite our nanoPVD benchtop physical vapour deposition system below: