Thermal Anneal

Complete thermal processing systems and bespoke components for high-temperature sample processing under controlled low-pressure, inert and reactive atmospheres.

In physical vapor deposition (PVD) processes, the annealing of substrates can be a crucial step that significantly impacts the final properties of thin films. Annealing, a heat treatment technique, modifies the microstructure of both the deposited material and the substrate, improving adhesion, crystallinity, and overall performance of the coating. This technique is widely used in industries such as semiconductor manufacturing, optics, and materials science.

Substrate heating is a common laboratory requirement, for numerous applications. Moorfield produce complete systems for precisely-controlled substrate heating up to 1000 °C under controlled atmospheres. A variety of different heating technologies are available—depending on the application. Stand-alone components including heating stages and power supplies can also be supplied.

We can offer the choice of ‘in-chamber’ annealing as part of the PVD process or a dedicated  benchtop system for applications that do not require full PVD capabilities.