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Benchtop Evaporation System

nanoPVD-T15A Thermal Evaporation System

Compact thermal and low-temperature evaporation for metals, organics and sensitive thin-film materials.

The nanoPVD-T15A gives research teams local evaporation capability where controllable thermal and low-temperature workflows matter more than sputtering source count.

ProcessThermal / LTE
FormatBenchtop PVD
Use caseSensitive materials
nanoPVD-T15A benchtop thermal evaporation system
nanoPVD-T15A benchtop thermal evaporation system

Research-grade capability without enterprise complexity

This platform is positioned for research teams that need controllable thin-film process access, practical laboratory integration and clear configuration choices.

  • Compact evaporation access for research laboratories
  • Thermal and low-temperature evaporation source configurations
  • Useful for metals, organics, electrodes and optical films
  • Recipe-led operation for repeatable development runs
  • Lower infrastructure burden than larger modular systems

Benefits that matter in a working research lab

Faster evaporation cycles

Keep thermal evaporation of electrodes, contact layers and specialist materials close to the research group so early-stage process changes can happen quickly.

Ease of use for mixed-experience teams

A compact format, touchscreen HMI and recipe-based operation make the platform approachable for shared labs while preserving research-grade control.

Research-grade evaporation flexibility

Supports practical evaporation methods for metals, volatile organics and sensitive materials where local access and careful process development matter.

Lower operational friction

The benchtop format gives departments useful PVD capability without the access complexity, services load and training burden of larger infrastructure.

Better use of premium tools

Develop baseline evaporation recipes locally and reserve larger shared systems for mature processes, integrated runs or higher-capacity work.

Designed for real devices

Useful for electrodes, interfaces, organic electronics, quantum-device studies, small-batch coating work and proof-of-concept materials research.

Typical configurations

Use these examples as starting points. Moorfield can refine the final specification around your materials, substrates, gases, recipes and workflow constraints.

Metals and electrodes

For research teams depositing contact metals, electrodes and interfaces.

  • Thermal evaporation method
  • Compact local process access
  • Useful for device prototyping

Low-temperature evaporation

For volatile organics and sensitive materials that benefit from lower-temperature source configurations.

  • LTE source options
  • Sensitive material fit
  • Organic electronics and interface research

Optical and functional films

For exploratory coating work where deposition simplicity and clean workflow matter.

  • High-vacuum benchtop chamber
  • Recipe-led operation
  • Functional thin-film R&D

Not sure which configuration is right for your research?

Discuss Your Application

Key features

Compact laboratory footprint

Research-grade thin-film capability in a practical benchtop format.

Configurable process approaches

Build around sputtering, evaporation or hybrid workflows depending on the model.

Recipe-led control

Touchscreen HMI and recipe workflows improve day-to-day repeatability.

High-vacuum platform

Turbomolecular pumping supports clean, controlled deposition conditions.

Flexible gas and source options

Process gases, source count and monitoring options can be matched to the application.

Research-first support

Moorfield helps specify the platform around your materials and target films.

Options and upgrades

Configure the platform around the process approach, substrate handling, automation and laboratory services your application needs. Options are confirmed with quotation for the final build.

Vacuum and platform

  • Dry backing pump
  • Fast chamber vent
  • High-vacuum pumping approach for thermal evaporation
  • Recipe save/load operation

Evaporation sources

  • Up to 4 LTE low-temperature evaporation sources
  • TE1 thermal evaporation source configuration
  • Source and shutter configuration for evaporation workflows
  • QCM rate/thickness monitoring where specified

Substrate handling

  • Substrate heating up to 500°C
  • Substrate rotation where specified
  • Z-shift and shutters where specified
  • Up to 4" substrates

Technical specifications

Exact specifications depend on final configuration and should be confirmed with quotation.

System typeBenchtop PVD / thermal and LTE evaporation
Base pressure5×10-7 mbar
Evaporation sourcesUp to 4 LTE low-temperature evaporation sources
Thermal evaporationTE1 + LTE sources
Maximum substrate size4" (100 mm)
Substrate heatingUp to 500°C optional
Glovebox compatibleNo
Warranty2 years

Applications

Published application-library examples and Bioz lookup results showing nanoPVD-T15A evaporation used for electrodes, organic and molecular films, sensors, energy devices and nanoscale spectroscopy workflows.

Enhanced photocurrent Quantum Dot Emission

Publication Title: Enhanced Photocurrent and Electrically Pumped Quantum Dot Emission from Single Plasmonic Nanoantennas

Lead facility: University of Cambridge

Moorfield product cited: nanoPVD-T15A

Read application

Quantum Sensing of Copper-Phthalocyanine Electron Spins

Publication Title: Quantum Sensing of Copper-Phthalocyanine Electron Spins via NV Relaxometry

Lead facility: Not stated in publication metadata

Moorfield product cited: nanoPVD-T15A

Read application

High-sensitivity ethanol vapor detection

Publication Title: High-sensitivity ethanol vapor detection using In 2 O 3 @ZnO core–shell nanomeshes fabricated via block copolymer templating

Lead facility: Warsaw University of Technology

Moorfield product cited: nanoPVD-T15A

Read application

Rechargeable Zn Microbatteries for On-Chip Use

Publication Title: A Photolithographable Electrolyte for Deeply Rechargeable Zn Microbatteries in On-Chip Devices

Lead facility: Chemnitz University of Technology

Moorfield product cited: nanoPVD-T15A

Read application

Single-molecule mid-infrared spectroscopy and detection

Publication Title: Single-molecule mid-infrared spectroscopy and detection through vibrationally assisted luminescence

Lead facility: University of Cambridge

Moorfield product cited: nanoPVD-T15A

Read application

Benign Solution-Processed Sb2Se3 Nanowires

Publication Title: Benign Solution-Processed Sb2se3 Nanowires for Photovoltaic Applications

Lead facility: Ben-Gurion University of the Negev

Moorfield product cited: nanoPVD-T15A

Read application

Decoupled High-Mobility Graphene

Publication Title: Decoupled High‐Mobility Graphene on Cu(111)/Sapphire via Chemical Vapor Deposition

Lead facility: Italian Institute of Technology

Moorfield product cited: nanoPVD-T15A

Read application

Bioz citation lookup

Publication Title: Bioz citation results for nanoPVD-T15A

Lead facility: Multiple published sources where available in Bioz

Moorfield product cited: nanoPVD-T15A

View Bioz citations

Product FAQ

Frequently asked questions

What materials can be deposited using the nanoPVD-T15A?

The nanoPVD-T15A supports thermal evaporation of metals, organics, and sensitive or low-melting-point materials that are not suited to sputtering.

Is substrate heating available on the nanoPVD-T15A?

Substrate heating options are available. Contact Moorfield to confirm temperature range and configuration for your specific application.

Can the nanoPVD-T15A be used for organic semiconductor deposition?

Yes. The low-temperature thermal evaporation approach makes it suitable for organic materials where sputtering plasma would damage the film or substrate.

Build the right nanoPVD-T15A configuration for your research

Tell us about your materials, substrates, process gases and target films. Moorfield will help specify a practical system configuration.

nanoPVD-T15A

The nanoPVD-T15A is a benchtop evaporation system optimised for deposition of various high-melting point metals and volatile organics. As compact as an electron microscopy coater, but with high-end hardware for research-grade results.

nanoPVD-T15A Benchtop PVD System

Optimised for thermal evaporation onto substrates up to 4″ diameter. It can be equipped with standard resistive evaporation sources and/or low-temperature evaporation (LTE) sources for deposition of metals and organics, respectively.

LTE sources are low thermal-mass for better control when evaporating volatile organic materials, while metals sources are our box-shielded TE1 models for efficient deposition and reduced cross-contamination.

Chamber access is via a hinged lid that opens to reveal a stage suitable for holding substrates up to 4″ in diameter. The chamber is tall, allowing for high-uniformity coating via evaporative techniques.

The units are easy to control via a touchscreen HMI interface, simple to maintain, have low running costs and come with a comprehensive range of safety features.

With a turbomolecular pumping system, high-vacuum base pressures, straightforward automated control via a touchscreen HMI and a range of options for flexible configuration, the nanoPVD-T15A is a versatile, efficient solution for world-class R&D applications.

Key features
  • Benchtop configuration
  • Organics and metals evaporation sources
  • High aspect-ratio chamber for uniform coating
  • Fully automatic operation via touchscreen HMI
  • Define/save multiple process recipes
  • Up to 4” diameter substrates
  • Base pressures <5 × 10-7 mbar
  • Equipped for easy servicing
  • Comprehensive safety features
  • Proven performance
Example Publications
Options
  • Dry backing pump
  • Fast chamber vent
  • Up to 4 LTE sources for organics
  • Up to 2 evaporation sources for metals
  • 500 °C substrate heating stage
  • Substrate rotation, Z-shift and shutters
  • Quartz crystal sensor head
Typical configurations

Metals deposition:
Two thermal evaporation sources for metals evaporation with shutters and quartz crystal sensor head for rate/thickness calibration.

Organics deposition:
Four LTE sources for organics deposition with shutters and quartz crystal sensor head for rate/thickness calibration.

Metals and organics deposition:
Two thermal evaporation sources and two LTE sources for metals and organics PVD, with shutters and quartz crystal sensor head.

Service requirements

All nanoPVD-T15A systems require chilled water, dry compressed air, nitrogen for venting (optional), and electrical power. Exact requirements will be provided with quotations or on request.

Protect your investment and maximise uptime

Your Moorfield system is a long-term asset that needs to operate reliably and repeatably. A Service Plan is designed to protect your investment by reducing unplanned downtime, improving system reliability, and giving your team faster access to expert support when you need it.

All plans include an annual preventive maintenance visit (with documented checks) plus remote technical support—helpful for troubleshooting issues quickly without waiting for an on-site visit. As your needs increase, higher tiers add greater consumables/parts cover, discounted call-outs and travel, priority scheduling, and training refresher days to help new users get up to speed and reduce avoidable errors.

Service Plans also support easier budgeting (fixed annual or monthly options on eligible tiers) and provide multi-system discounts.

Ask us which plan best fits your throughput demands and budget priorities using our CONTACT US FORM