Specify sputtering targets with confidence
Source target materials and consumables for Moorfield magnetron sputtering platforms, from routine metals to research-grade compound materials.
Research-grade supply support
Targets and consumables for thin-film R&D workflows
Sputtering target choice affects film quality, process stability, deposition rate and repeatability. Moorfield can help you identify suitable target materials and consumables for existing Moorfield systems, new configurations and application-led development work.
Need help before ordering? Share your material, substrate, process gases and system model and we will help confirm the practical approach before quotation.
Quotation checklist
What to include in a target request
The more complete the process context, the faster we can qualify the request and reduce back-and-forth before quotation.
Useful details
- Target material, composition and preferred purity.
- Target diameter, thickness and any bonding or backing plate requirements.
- Moorfield system model and magnetron source size.
- DC, RF or reactive sputtering process, if known.
- Process gases, substrate type and target film objective.
- Quantity, delivery timing and any documentation requirements.
Request a quotation
Use the form below to request pricing and availability. Include the material, target geometry, system model and intended process where possible.
Consumables & Sputtering Targets
We can supply a wide array of system consumables such as sputtering target materials, including metals, alloys, and compound materials, depending on your specific application.
Use the form below to request a quotation.