Bench-Top CVD System
nanoCVD-8G Bench-Top CVD System
Compact chemical vapour deposition for graphene growth.
nanoCVD-8G gives research teams an accessible way into controlled CVD workflows without production-scale infrastructure.
Research-grade capability without enterprise complexity
This platform is positioned for research teams that need controllable thin-film process access, practical laboratory integration and clear configuration choices.
- Controlled CVD access in a compact research format
- Strong fit for graphene workflows
- Gas handling and process monitoring options by configuration
- Designed for universities and advanced R&D labs
- Lower infrastructure burden than large production-derived systems
Typical configurations
Use these examples as starting points. Moorfield can refine the final specification around your materials, substrates, gases, recipes and workflow constraints.
Graphene growth
For research teams developing graphene growth and transfer workflows.
- Controlled CVD process approach
- Research-focused operation
- Nanomaterials development
Carbon nanomaterials
For exploratory carbon-based materials and coatings research.
- Gas handling options
- Process experimentation
- Compact lab integration
Advanced CVD R&D
For labs that need a practical local CVD process tool.
- Application-led specification
- Repeatable process workflows
- University and R&D fit
Not sure which configuration is right for your research?
Discuss Your ApplicationKey features
Dedicated process capability
Focused platform design for the target process rather than generic equipment messaging.
Research workflow fit
Built for universities, R&D laboratories and pilot development environments.
Controlled operation
Recipe-led controls and application-specific configuration improve repeatability.
Compact laboratory integration
Add capability close to the research team without enterprise-scale infrastructure.
Application-led specification
Moorfield can configure the system around materials, substrates and process objectives.
Serviceable design
Designed for practical operation, maintenance and long-term research use.
Options and upgrades
Configure the platform around the process approach, substrate handling, automation and laboratory services your application needs.
Technical specifications
A scannable overview of the core platform. Exact specifications depend on final configuration.
| System type | Bench-top chemical vapour deposition |
|---|---|
| Process type | Chemical vapour deposition |
| Best fit | Graphene, carbon nanomaterials and advanced materials growth |
| Research value | Compact CVD capability for process development |
| Applications | Nanomaterials, semiconductor research and surface engineering |
Applications
Graphene and nanomaterials application-library examples relevant to nanoCVD-8G discussions. The product cited on each card is shown explicitly.
Graphene soft-etching with the nanoETCH
Publication Title: Graphene soft-etching with the nanoETCH
Lead facility: Not stated in publication metadata
Moorfield product cited: nanoETCH, nanoCVD-8G
Read applicationDecoupled High-Mobility Graphene
Publication Title: Decoupled High‐Mobility Graphene on Cu(111)/Sapphire via Chemical Vapor Deposition
Lead facility: Italian Institute of Technology
Moorfield product cited: nanoPVD-T15A
Read applicationDirect synthesis of nanopatterned graphene
Publication Title: Direct synthesis of nanopatterned epitaxial graphene on silicon carbide
Lead facility: University of Technology Sydney
Moorfield product cited: nanoPVD-S10A
Read applicationsp2-rich dendrite-like carbon nanowalls
Publication Title: sp2 -rich dendrite-like carbon nanowalls as effective electrode for environmental monitoring of explosive nitroaromatic
Lead facility: Gdańsk University of Technology
Moorfield product cited: nanoPVD-S10A
Read applicationTransition metal oxide nanostructures
Publication Title: Block Copolymer-Templated, Single-Step Synthesis of Transition Metal Oxide Nanostructures for Sensing Applications
Lead facility: University of Warsaw
Moorfield product cited: nanoPVD-T15A
Read applicationResources and next steps
Related systems
Build the right nanoCVD-8G configuration for your research
Tell us about your materials, substrates, process gases and target films. Moorfield will help specify a practical system configuration.
nanoCVD-8G
The nanoCVD-8G is a graphene CVD system that provides precise control over conditions such as pressure, temperature and gas chemistry – critical for successful production of graphene.
nanoCVD-8G benchtop graphene synthesis
Developed in collaboration with academic groups, the nanoCVD-8G is a graphene CVD system that provides precise control over conditions such as pressure, temperature and gas chemistry – critical for successful production of graphene.
The units implement the cold-wall variant of the CVD method, enabling reduced contamination, low running costs and better control as compared to tube-furnace counterparts.
User operation is via a touchscreen HMI and is recipe-based, with all hardware being fully automated. Comprehensive safety features protect users and the system itself. Included PC software enables data-logging and offline recipe definition. All units come with expert support.
Systems are quick to install and ideal for research groups requiring ongoing rapid access to high-quality graphene for R&D applications.
Key features
- Ultra-compact, benchtop, CVD system
- Reproducible synthesis of high-quality graphene
- Precise control of conditions
- 1100 °C maximum temperature
- Process times <30 minutes
- 20 × 40 mm2 maximum substrate size
- Fully-automatic
- User-friendly, touchscreen HMI operation
- Define/save multiple growth recipes
- PC connection for data-logging
- Equipped for easy servicing
- Comprehensive safety features
- Cleanroom compatible
- Proven performance
