Argon Plasma Cleaning: A Targeted, Inert Approach to Surface Preparation

Argon plasma cleaning is a specialised method within the plasma cleaning spectrum that relies on the physical ablation of contaminants. Unlike oxygen or air plasma, which use chemical reactions to break down residues, argon plasma is entirely inert—making it a gentle yet highly effective solution for sensitive substrates.

How Argon Plasma Cleaning Works

1.Inert Gas Environment
Argon is introduced into the plasma cleaning system and ionised to create a stream of energized ions and neutral atoms. Because argon is non-reactive, it preserves the underlying surface chemistry while dislodging contaminants at a microscopic level.

2.Physical Ablation
Particles are physically knocked away from the substrate rather than chemically dissolved. This method is particularly beneficial for delicate materials or surfaces where minimal alteration is crucial.

3.Uniform Surface Treatment
The system delivers even coverage, ensuring every area of the substrate receives consistent treatment—vital for repeatable, high-quality results in manufacturing processes.

Key Benefits:

• Gentle on Sensitive Substrates
  Because argon does not chemically alter surfaces, substrates such as polymers, thin films, or specialty metals remain structurally intact.
• Reduced Surface Oxidation
  In the absence of oxygen, argon plasma minimises unwanted oxidation, making it ideal for applications where preserving specific surface properties is critical.
• Clean without Chemical Solvents
  Unlike other plasma cleaning methods, argon plasma requires no hazardous solvents—leading to lower environmental impact and improved operator safety.
• High Precision
  With physical ablation even tiny contaminants lodged in micro-crevices are removed, ensuring a thoroughly cleaned surface ready for bonding, coating, or further processing.

Why Choose Moorfield?

At Moorfield, our expertise extends to advanced, customisable solutions. We understand the importance of preserving the integrity of substrates while achieving reliable contaminant removal.

Available as a compact, fully functional benchtop system, our nanoETCH provides excellent performance with a very simple to use touch-screen interface and soft-etch or fluorine based etching modes.

Contact Moorfield today to discover how nanoETCH can revolutionise your substrate preparation and overall manufacturing success.