nanoEM

The nanoEM system is the first electron microscopy coating tool with a full, research-grade feature set.

  • nanoEM front view showing deposition chamber and touchscreen HMI for system control
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The units include stainless-steel chambers, turbomolecular pumping systems, water-cooled circular magnetrons for continuous operation, and a precision sputtering power supply (DC; up to 300 W) as standard, all in a space-saving benchtop package.

Ease-of-use and coating speed are built in for routine preparation of TEM/SEM samples (e.g., with sputtering of gold and/or carbon), but with high-end components and compatibility with conventional targets, the possibilities are endless.

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Key features:

  • Researxh-grade electron microscopy coating
  • Compact, benchtop unit
  • SEM stub/TEM grid/wafer supports
  • Up to 2 × 2” magnetron sputtering sources
  • Industry- standard sputtering targets
  • Turbomolecular pumping to <5 × 10– 7 mbar
  • MFC- controlled process gas
  • Variable output DC power supply, up to 300 W
  • Fully automatic, recipe operation via touchscreen HMI
  • Equipped for easy servicing
  • Comprehensive safety features
  • Cleanroom compatible
  • Proven performance

Options:

Available options include:

  • Chamber viewports
  • Backing pump only
  • Dry pumping
  • Automatic pressure control
  • Shutter
  • Plasma glow electrode
  • Stage rotation and tilt
  • Quartz crystal sensor head process monitoring

System requirements:

All nanoEM systems require chilled water, dry compressed air, nitrogen for venting (optional), process gas (Ar), and electrical power.

Exact requirements will be provided with quotations or on request.