As a result, and in contrast to conventional etching solutions, the tool enables high-performance for key applications in graphene and 2D materials:
As standard, the system is suitable for accepting substrates up to 3″ diameter. A turbomolecular pumping system enables contamination-free operation. Substrates rest on a purpose-designed stage, and power is supplied from an RF unit engineered to allow for fine control at low powers. Together with carefully modelled in-chamber RF acoustics, this provides the tool with its unique capabilities.
The system can be connected to a PC for data-logging. The nanoETCH tool is now installed in leading graphene/2D material research labs, including ICFO (Spain), the Cambridge Graphene Centre and the UK National Graphene Institute.
Sassi, U., et al. Nature Communications 2017 DOI: 10.1038/ncomms14311 This […]
All nanoETCH systems require chilled water, dry compressed air, nitrogen for venting (optional), process gas supplies, and electrical power.
Exact requirements will be provided with quotations or on request.