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Low temperature evaporation systems

Minilab low temperature evaporation systems

The MiniLab range from Moorfield: Flexible, modular PVD systems for high-quality R&D and pilot-scale production.

MiniLab 026

MiniLab 026 systems are compact floor standing vacuum evaporators with easy-access ‘clam-shell’ chambers. Suitable for metal, dielectric and organics deposition via evaporation and sputtering techniques.

MiniLab 060

MiniLab 060 systems have cubic chambers ideal for magnetron sputtering (up to 4 × 3″ diameter sources), but that can also be fitted with evaporation components. The smallest MiniLab that can be fitetd with a load-lock

MiniLab 080

Tall chambers ideally suited for evaporation techniques that require longer working distances for optimum uniformity.

MiniLab 090

Glovebox-compatible chambers with front and rear doors that are suitable for supporting all major deposition techniques.

MiniLab 125

Large cubic chambers for large-scale R&D up to pilot-scale production. Capable of holding all PVD techniques, and can be fitted with load-locks and planetary stages for high-throughput operation.

Other low temperature evaporation systems

Moorfield M307

Entry-level vacuum evaporator that enables high-quality thin films at an affordable price.

The system is flexible and retains an upgrade path in line with the product philosophy of the MiniLab range.

nanoPVD-T15A

Thermal evaporation for organics and metals deposition

Benchtop, turnkey system for high-performance evaporation. Up to 4 low-temperature evaporation (LTE) sources for organics and 2 standard thermal evaporation sources for metals.

See also

Knowledge base articles

Graphene soft-etching with the nanoETCH

Moorfield graphene soft-etching technology allows for the controlled removal of graphene and 2D materials, without cross-linking photoresists that can lead to residual contamination that affects device performance.

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Confocal magnetron sputtering

Confocal magnetron sputtering

Confocal magnetron sputtering is now routinely employed for the production of excellent uniformity, multi-layer films by magnetron sputtering. This application note describes the technology, and explains the principles behind it.

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nanoPVD-T15A chamber interior with two TE1 sources for metals evaporation

PVD techniques

Moorfield are experienced in all common PVD techniques and can supply systems with fully-integrated component sets. Standalone components also available.

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Magnetron sputtering

Magnetron sputtering

Magnetron sputtering is a versatile technique suited to a wide range of materials – and provides excellent coating-substrate adhesion.

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