High-performance evaporation and magnetron sputtering techniques within one process chamber — all housed in a compact, modular package for benchtop location. Ultimate flexibility for research-grade thin-film deposition requiring a space-friendly footprint.
The latest model in Moorfield’s nanoPVD range, model ST15A has been purpose-designed to accommodate both vacuum evaporation and magnetron sputtering sources within the a single process chamber. Available source types are low-temperature evaporation (LTE), standard resistive evaporation, and magnetron sputtering (2″ targets) for deposition of organics, dielectrics, and metals.
Each process chamber can hold up to 3 sources of up to 2 types. A full range of power supplies are available allowing for deposition of multiple film types — metals, insulators, dielectrics and organics — using the same system and even within the same process run.
As with all nanoPVD tools, chamber access is via a hinged lid, that opens to reveal a stage suitable for holding substrates up to 4″/100 mm diameter. The chamber is tall, allowing for high-uniformity coating via fitted techniques.
The units are easy to control via a touchscreen HMI interface, simple to maintain, have low running costs and come with a comprehensive range of safety features.
With a turbomolecular pumping system, high-vacuum base pressures, straightforward automated control via a touchscreen HMI and a range of options for flexible configuration, the nanoPVD-ST15A combines the proven ease-of-use and high-end performance the nanoPVD range has become known for with ultimate applications flexibility.