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Engineered to defection

Researchers at the University of Cambridge and Nokia Research Centre have used Moorfield’s nanoETCH to carefully ‘damage’ single graphene sheets in order to minimise contact resistances in fabricated devices.

The technique, a form of defect engineering, is reported in Nature Communications as part of work on room-temperature pyroelectric bolometers.

Dr. Ugo Sassi, lead author of the work, said:

“Moorfield’s soft-etching technology was critical in allowing us create devices for accurate analysis of the underlying physical phenomena we set out to study”.

More information on the nanoETCH system and soft-etching technology can be found here.

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