Evonetix

Evonetix Installation a Success

At Evonetix, we are pioneering an innovative approach to scalable and high-fidelity gene synthesis. We wanted to build a capability to evaporate metals onto various

ICFO

At ICFO, we are working to establish a world-class research centre in new materials. As part of this, recent installations of Moorfield glovebox-integrated thermal annealing

Manchester Metropolitan University

Manchester Metropolitan University

At MMU, we recently established the Manchester Fuel Cell Innovation Centre to develop innovative technologies for harnessing the power of renewable energy. For this, we

Northumbria University

Northumbria University

At Northumbria University, we are working on cutting-edge applications of various materials with a particular focus on photovoltaics. As part of this, recent installations of

University of Bath

University of Bath

Moorfield recently supplied a nanoPVD-T15A to the University of Bath, UK. Find out more about the system here. Our research focusses on electrochemistry, energy materials

University of Manchester

University of Manchester

My team recently worked with Moorfield to implement a glovebox-integrated combined thermal annealing and soft-etching station customised for our application. Located in the new NGI,

University of Warwick

University of Warwick

Here at the Electrochemistry & Interfaces Group, we study properties and applications of novel materials including diamond, carbon nanotubes and graphene. Since 2004, Moorfield systems

Durham University

Durham University

Moorfield’s cutting edge deposition systems have enabled our R&D into state-of-the-art microelectronic devices since we received our first system in 2006. We now have multiple

University of Exeter

The nanoCVD-8G from Moorfield allowed us to grow high quality monolayer graphene with a 99% reduction in production costs compared to existing processes. Developing such

Nokia

Nokia Research Centre

At Nokia Research Centre, we have developed cutting-edge applications of Moorfield soft-etching technology based on its unique level of control at low plasma powers. We

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