CVD (Chemical Vapour Deposition)

Chemical Vapour Deposition

Moorfield's nanoCVD range allow for rapid, cost-effective production of graphene and carbon nanotubes using scalable CVD methods. Developed together with academic partners and with proven performance including high-impact publications.

Graphene and carbon nanotubes (CNTs) have been the focus of huge research efforts, given their unique electrical, mechanical and structural properties. Thanks to these properties, their introduction is expected to prove disruptive for a huge range of applications. In addition, exotic characteristics of these materials mean they will enable new types of devices and products.

nanoCVD systems from Moorfield are designed to produce conditions that allow for rapid, cost-effective production of graphene and carbon nanotubes (CNTs), through implementation of chemical vapour deposition (CVD) schemes. CVD methods are considered most promising for industrial production of high-quality carbon nanomaterials.

System development has been carried out in collaboration with academic partners and has been awarded financial support for innovation. The tools are compact, easy-to-use and offer proven performance (including peer-reviewed publications in high profile journals).

Model nanoCVD-8G

Model nanoCVD-8G

For graphene.

Optimised for high-throughput growth of graphene samples. Heating to high temperatures (up to 1100 °C) under controlled low-pressure atmospheres based on flows of argon, hydrogen and methane.

Model nanoCVD-8N

Model nanoCVD-8N

For carbon nanotubes.

High-throughput carbon nanotube (CNT) growth with atmospheric pressure operation. Suitable for various substrate/catalyst combinations. High temperatures up to 1100 °C, under controlled conditions including flows of argon, hydrogen and methane.

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