NanoPVD

High-performance, high-vacuum deposition systems in compact packages. Superior, space-efficient performance for a variety of thin-film deposition techniques.

Moorfield have recently introduced the nanoPVD series of benchtop deposition systems. Compact and suitable for benchtop location — but not to be confused with microscopy-related products — nanoPVD systems are derived from proven R&D thin-film system technology and have been developed through extensive collaboration with leading academic groups. The tools are optimised for ease of use, represent outstanding value for money and are ideal where available space and budgets are key considerations — without compromising on quality of results.

Common features include fully automated turbomolecular pumping systems for base pressures of < 5 × 10-7 mbar, 7" colour touchscreen HMIs for all user operation, standard mains power requirements, comprehensive safety features, cleanroom compatibility and proven performance.

Model S10A

Model S10A

Magnetron sputtering with RF and/or DC power

Benchtop, turnkey system for high performance magnetron sputtering. Up to 3 sources for 2" targets, RF and DC power supplies, and up to 3 MFC-controlled process gas lines for standard or reactive sputtering.

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Model S10A, Wide-Area (WA) configuration

Model S10A, Wide-Area (WA) configuration

Magnetron sputtering, wide-area

The nanoPVD-S10A-WA system is an enhanced, application specific version of the model S10A that allows for even coating on substrates up to 8" diameter.

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Model T15A

Model T15A

Thermal evaporation for organics and metals deposition

Benchtop, turnkey system for high-performance evaporation. Up to 4 low-temperature evaporation (LTE) sources for organics and 2 standard thermal evaporation sources for metals.

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