nanoCVD 8N

nanoCVD

8N

  • nanoCVD-8N systsem for high-quality carbon nanotube synthesis

  • Close-up of substrate stage assembly of nanoCVD-8N system

  • Scanning electron microscopy (SEM) image of random carbon nanotube network produced with nanoCVD-8N system

  • Scanning electron microscopy (SEM) image of carbon nanotube vertically-aligned 'forest', produced using a nanoCVD-8N system and high catalyst nanoparticle densities

  • Atomic force microscopy (AFM) scan of surface-bound single-walled cabron nanotubes; catalyst nanoparticle are also visible

  • Reman spectrum of single-walled carbon nanotubes produced using a nanoCVD-8N with an SiO2/Si substrate and Fe catalyst nanoparticles

 

Compact, turn-key and scalable CVD system for high-throughput carbon nanotube synthesis. Proven performance.

The nanoCVD-8N provides precise control over conditions such as temperature and gas chemistry that are critical for reproducible production of surface-bound carbon nanotube (CNT) arrays, primarily the single-walled form. Developed in collaboration with leading academic partners, the units implement the cold-wall variant of the CVD method, enabling reduced contamination, low running costs and better control as compared to tube-furnace counterparts.

User operation is via a touchscreen HMI and is recipe-based, with all hardware being fully automated. Comprehensive safety features protect users and the system itself. Included PC software enables data-logging and offline recipe definition. All units come with expert support.

Systems are quick to install and ideal for research groups requiring ongoing rapid access to high-quality CNTs for R&D applications.

Depending on recipes and substrate/catalyst combinations, nanoCVD-8N units can create different CNT morphologies:

  • Random: Multiply interconnected SWNTs
  • Aligned: Parallel SWNTs
  • ‘Forests’: Vertically stacked SWNTs


CNTS can be formed using a variety of substrates, such as SiO2/Si, Si3N4 and quartz, while typical catalysts include nanoparticles of Fe, Co and Ni.

Key Features:

  • Ultra-compact, benchtop, atmospheric-pressure CVD system
  • Reproducible synthesis of high-quality carbon nanotubes
  • Optimised for single-walled carbon nanotubes
  • Precise control of conditions
  • 1100 °C maximum temperature
  • MFC-controlled process gases (argon, hydrogen and methane)
  • 20 × 40 mm2 maximum substrate size
  • Process times <30 minutes
  • Fully-automatic
  • User-friendly, touchscreen interface
  • Define/save multiple growth recipes
  • PC connection for data-logging
  • Equipped for easy servicing
  • Comprehensive safety features
  • Cleanroom compatible
  • Proven performance

Options:

The nanoCVD-8N is available with a rotary or scroll (dry) backing pump.

Service Requirements:

The nanoCVD-8N requires inert service gas, high-purity process gases (argon, hydrogen and methane) and electrical power.

 
© 2017 Moorfield Nanotechnology Limited.