nanoCVD 8G

nanoCVD

8G

  • nanoCVD 8G

  • nanoCVD 8G

  • nanoCVD 8G

  • nanoCVD 8G

  • nanoCVD 8G

 

Compact, turn-key and scalable chemical vapour deposition (CVD) system for rapid synthesis of high-quality graphene. Proven performance.

Key features:

  • Ultra-compact, benchtop CVD system
  • Reproducible graphene synthesis
  • Precise control of conditions
  • 1100°C maximum temperature
  • Process times <30 mins
  • 20×40 mm2 maximum substrate size
  • Fully automatic
  • User-friendly, touchscreen interface
  • Create/save multiple growth programs
  • PC connection for data-logging
  • Equipped for easy servicing
  • Comprehensive safety features

Technology:

The nanoCVD-8G has been developed in collaboration with academic experts. The design is optimised to allow for a wide range of synthetic schemes. These include those based on metal substrates and CH4 feedstock that are widely employed for producing high-quality graphene.

The system contains a low thermal-mass heater stage for uniform heating of film and foil substrates. The stage slides into a small volume, cold-walled reaction chamber. Comprehensive software allows for definition, saving and automated running of growth programmes.

This technology is highly scalable.

Growth schemes:

Compatible with numerous CVD methods:

Substrates: Cu, Ni, etc. (films or foils)
Feedstocks: CH4, C2H4, solids (PMMA), etc.
Process gases: H2, Ar, N2, etc.

Configuration:

Standard: Low-pressure operation (<20 Torr), CH4 feedstock, Ar and H2 process gases.
Options: Additional gas lines, dry/faster pumping systems and others (requests welcome).

Applications:

Pure research, product development and education in:

  • Electrodes for photovoltaics
  • Touchscreen displays
  • High-performance electronics
  • Biological, chemical and mechanical sensors
  • Electrical energy storage
 
© 2017 Moorfield Nanotechnology Limited.