nanoCVD 8G

nanoCVD

8G

  • nanoCVD-8G system with chamber open to reveal substrate stage

  • Close-up of nanoCVD-8G substrate stage

  • nanoCVD-8G substrate stage withdrawn from CVD process chamber

  • Optical microscopy of nanoCVD-8G graphene on SiO2/Si wafer

  • Raman spectroscopy of nanoCVD-8G graphene on SiO2/Si wafer

  • nanoCVD-8G graphene: Longitudinal resistivity and Hall conductance data indicating half integer quantum Hall effect unique to monolayer graphene

 

Benchtop CVD system for rapid, on-demand synthesis of high-quality graphene. Fully automated cold-wall technology for reduced contamination and running costs, and enhanced conditions control.

Developed in collaboration with academic groups, the nanoCVD-8G provides precise control over conditions such as pressure, temperature and gas chemistry that are critical for successful production of graphene. The units implement the cold-wall variant of the CVD method, enabling reduced contamination, low running costs and better control as compared to tube-furnace counterparts.

User operation is via a touchscreen HMI and is recipe-based, with all hardware being fully automated. Comprehensive safety features protect users and the system itself. Included PC software enables data-logging and offline recipe definition. All units come with expert support.

Systems are quick to install and ideal for research groups requiring ongoing rapid access to high-quality graphene for R&D applications.

Key Features:

  • Ultra-compact, benchtop, low-pressure CVD system
  • Reproducible synthesis of high-quality graphene
  • Precise control of conditions
  • 1100 °C maximum temperature
  • MFC-controlled process gases (argon, hydrogen and methane)
  • 20 × 40 mm2 maximum substrate size
  • Process times <30 minutes
  • Fully-automatic
  • User-friendly, touchscreen interface
  • Define/save multiple growth recipes
  • PC connection for data-logging
  • Equipped for easy servicing
  • Comprehensive safety features
  • Cleanroom compatible
  • Proven performance

Options:

The nanoCVD-8G is available with a rotary or scroll (dry) backing pump.

Service Requirements:

The nanoCVD-8G requires inert service gas, high-purity process gases (argon, hydrogen and methane) and electrical power.

 
© 2017 Moorfield Nanotechnology Limited.