- About us
Compact, turn-key and scalable chemical vapour deposition (CVD) system for rapid synthesis of high-quality graphene. Proven performance.
The nanoCVD-8G has been developed in collaboration with academic experts. The design is optimised to allow for a wide range of synthetic schemes. These include those based on metal substrates and CH4 feedstock that are widely employed for producing high-quality graphene.
The system contains a low thermal-mass heater stage for uniform heating of film and foil substrates. The stage slides into a small volume, cold-walled reaction chamber. Comprehensive software allows for definition, saving and automated running of growth programmes.
This technology is highly scalable.
Compatible with numerous CVD methods:
Substrates: Cu, Ni, etc. (films or foils)
Feedstocks: CH4, C2H4, solids (PMMA), etc.
Process gases: H2, Ar, N2, etc.
Standard: Low-pressure operation (<20 Torr), CH4 feedstock, Ar and H2 process gases.
Options: Additional gas lines, dry/faster pumping systems and others (requests welcome).
Pure research, product development and education in: