nanocvd

Compact, turn-key and scalable CVD systems for high-throughput graphene and carbon nanotube synthesis.

Graphene and carbon nanotubes (CNTs) have been the focus of huge research efforts, given their unique electrical, mechanical and structural properties. Thanks to these properties, their introduction is expected to prove disruptive for a huge range of applications. In addition, exotic characteristics of these materials mean they will enable new types of devices and products.

nanoCVD systems from Moorfield are designed to produce conditions that allow for rapid, cost-effective production of graphene and carbon nanotubes (CNTs), through the implementation of chemical vapour deposition (CVD) schemes. CVD methods are considered most promising for the industrial production of high-quality carbon nano materials.

Model nanoCVD-8G

Model nanoCVD-8G

For graphene

The nanoCVD-8G is optimised to enable users to carry out schemes for high-throughput growth of graphene samples by CVD on metal substrates (e.g. nickel). For this, it provides for heating to high temperatures (up to 1100°C) under controlled low-pressure atmospheres based on flows of argon, hydrogen and methane.

nanoCVD-WPG

Model nanoCVD-WPG

For graphene, wafer-scale, plasma-enhanced

The nanoCVD-8N is optimised for high-throughput carbon nanotube (CNT) growth with various substrate/catalyst combinations. The system provides for heating to high temperatures (up to 1100°C) under controlled atmospheres containing flows of argon, hydrogen and methane.

nanoCVD-8N

Model nanoCVD-8N

For carbon nanotubes

The nanoCVD-8N is optimised for high-throughput carbon nanotube (CNT) growth with various substrate/catalyst combinations. The system provides for heating to high temperatures (up to 1100°C) under controlled atmospheres containing flows of argon, hydrogen and methane.

© 2016 Moorfield Nanotechnology Limited.