Minilab 125

MiniLab

125

  • Minilab 125 system for pilot-scale magnetron sputtering work

  • Minilab 125 magnetron sputtering system with triple-rack frame

  • Interior of Minilab 125 for sputter-down magnetron sputtering, with heated substrate stage

  • Close-up of Moorfield magnetron sources in Minilab 125 system, for sputter-down operation and with flexible head angle and vertical position

  • Minilab 125 system configured for sputter-up magnetron sputtering, with automated control via quartz crystals sensor heads

  • Minilab 125 chamber roof, with removeable top-plate allowing for future re-configuration

  • Inficon SQC-310 process controller onboard MiniLab 125 system, allowing for automated process control according to user-defined rates/thicknesses

  • Inficon SQC-310 process controller

  • Top of Minilab 125 system fitted with load-lock

  • Load-lock on Minilab 125 for fast sample entry/removal

  • MiniLab 125 substrate heating stage for 800 °C platen temperatures

  • Inserting substrates into a MiniLab 125 load-lock

 

MiniLab 125 tools take the modular concept to the pilot-scale level. Large chambers allow for increased-size component sets for coating large areas, and a range of load-lock options enable high-throughput operation. At the same time, systems are fully customisable to match specific applications.

MiniLab 125 systems are floor-standing vacuum evaporators for metal, dielectric and/or organics thin-film deposition. All systems contain a box-type stainless-steel chamber with front door for loading/unloading. Large chamber volumes enable large sources for pilot-sale coating, or multiple techniques for a flexible R&D tool. Systems are available fitted with all major deposition techniques and stages customised to specific substrates. Turbomolecular pumping systems are standard, for high-vacuum base pressures of better than 5 × 10-7 mbar. Exact setup is extremely flexible and dependent on customer budget and applications.

Key Features:

  • Modular design
  • Front sliding door for in-glovebox loading
  • Rear door for service access
  • Turbomolecular or cryo pumping systems
  • Base pressures <5 × 10-7 mbar
  • Metals, dielectrics and organics deposition
  • Up to 11” diameter substrates
  • Touchscreen HMI/PC for system control
  • Equipped for easy servicing
  • Comprehensive safety features and interlocks
  • Cleanroom compatible

Techniques:

MiniLab 080 systems can be fitted with the following techniques:

  • Thermal evaporation
  • Low-temperature thermal evaporation (LTE)
  • E-beam evaporation
  • Magnetron sputtering

Options:

Available options include:

  • Pumping: Turbomolecular or cryogenic high-vacuum pumps, rotary or scroll backing pumps.
  • Gas/pressure: Manual or automatic control via MFCs and throttle valves.
  • Load-locks: Single- and multiple-sample.
  • Stages: Rotation, heating, cooling, Z-shift, bias and planetary.
  • Shutters: Source and substrate, pneumatic or motorised.
  • Operation: Manual or automatic via front panels, touchscreen HMI or PC.
  • Process: Quartz crystal sensor heads for rate/thickness monitoring or feedback-loop control.

Typical Configurations:

MiniLab 090 instruments are available in a variety of configurations. Typical setups include:

  • Thermal evaporation (metals): Four-source TE4 thermal evaporation component with source shutters and rotation stage. High power TEC-4A power supply and controller with recipe-based automated control. Quartz crystal sensor head with PC software for rate/thickness monitoring.
  • Thermal evaporation (metals and organics): Two TE1 thermal evaporation sources for metals and four LTE-1CC components for organics. Source shutters and rotation stage. Evaporation power supplies linked to quartz crystal sensor head and Inficon SQC-310 process controller for automated process control per user-defined rates/thicknesses.
  • E-beam evaporation: Multi-pocket (e.g., 6 × 7 cc or 8 × 4 cc) water-cooled e-beam source with 5 kW power supply/controller and automated pocket selection. Source and substrate shutters, and rotation. Quartz crystal sensor heads with Inficon SQC-310 process controller for automated process control per user-defined rates/thicknesses.
  • Magnetron sputtering: Up to four water-cooled magnetron sources for 3" circular targets. RF and DC power supplies with SputterSwitch technology for shared outputs. Source shutters and substrate rotation. Recipe-based power vs. time process control.

    Magnetron sputtering sources can be added alongside the above techniques.



Call us today to discuss your requirements!

Service Requirements:

All MiniLab 090 tools require chilled water, dry compressed air, nitrogen for venting (optional) and electrical power (three-phase for e-beam evaporation).

Sputtering systems also require process gases (argon, oxygen and nitrogen).

Exact requirements will be provided with quotations or on request.

 
© 2017 Moorfield Nanotechnology Limited.