Glovebox Annealing

Glovebox

Annealing

  • Glovebox setup with MiniLab 026 annealing system (left-most tool withint the glovebox setup), MiniLab 090 e-beam evaporation system and nanoETCH tool

  • MiniLab 026 chamber confiured for substrate heating to 600 °C under controlled-chemistry atmospheres

  • Close-up of quartz lamp substrate heating stage for 600 °C substrate temperatures

  • Resistive element stage for 1000 °C platen temperatures

  • Combined glovebox-compatible annealing/soft-etching station based on the MiniLab 026 platform

  • MiniLab 026 lid with shuttered viewport for annealing/soft-etching applications

 

Glovebox-integrated MiniLab systems with annealing hardware for substrate heating under controlled conditions, and transfer to/from inert atmospheres.

A variety of R&D applications require substrate heating under controlled conditions, e.g., for device or functional material preparation. Often, sample transfer to and from inert atmospheres is a co-requirement and in this case Moorfield are able to assist.

Glovebox-compatible MiniLab 026 systems can be fitted with a variety of heating technologies:

  • Quartz lamp: This technology uses quartz lamps to generate IR radiation. A cost-effective means of heating for substrate temperatures up to 500 °C, and compatible with most atmospheres.
  • Carbon-carbon composite (CCC): Where substrate temperatures above 500 °C are required, CCC elements are used. Suitable for heating up to 1000 °C.
  • SiC-coated CCC: When high temperatures and oxygen resistance are required, CCC elements are coated with a resistant layer of SiC.

Heating stages for substrate diameters up to 6" are available.

In addition, tools can be fitted with MFC-controlled process gases and fully-automatic pressure control.

More Information:

For more information on Moorfield substrate annealing technology and MiniLab 026 systems, see the following pages:

Contact us today to discuss your application!

 
© 2017 Moorfield Nanotechnology Limited.