Anneal

Moorfield

ANNEAL

  • ANNEAL

  • Quartz lamp stage with water-cooled enclosure and extra thermocouple

  • Quartz lamp stage, platen removed

  • CCC-element stage for 1000 ° C substrate temperatures

 

High-temperature substrate annealing up to 1000 °C with precision atmosphere control.

ANNEAL systems are optimised for the thermal treatment of 2D materials and wafers under controlled atmospheres. Substrates are supported face-up on stage-top platens that are situated centrally inside a stainless-steel high-vacuum chamber fitted with appropriate heat shielding and a shuttered viewport. Heating is via a heat source located beneath the platen. Maximum temperatures up to 1000 °C are possible—depending on the heating technology used (see below).

Key features:

  • Up to 6” substrate diameters
  • Stage temperatures up to 1000 °C
  • Choice of heating technologies
  • MFCs for process gas introduction
  • Precise pressure control
  • Turbomolecular pumping systems
  • Base pressures < 5 × 10-7 mbar
  • Easy sample access
  • Easy operation via touchscreen HMIs
  • Define/save multiple process recipes
  • Straightforward maintenance/servicing
  • Comprehensive safety features
  • Cleanroom compatible
  • Proven performance

Heating technologies:

  • Quartz lamp: This technology uses quartz lamps to generate IR radiation. A cost-effective means of heating for substrate temperatures up to 350 °C, and compatible with most atmospheres.
  • Carbon-carbon composite (CCC): Where substrate temperatures above 350 °C are required, CCC elements are used. Suitable for heating up to 1000 °C.
  • SiC-coated CCC: When high temperatures and oxygen resistance are required, CCC elements are coated with a resistant layer of SiC.

Gas/pressure control:

Gas introduction: The systems can be fitted with up to 3 mass flow controllers (MFCs) for process gas introduction. Typical gases are Ar, O2 and N2. Flexible MFC full scale flow rates. Pressure measurement: As standard, ANNEAL systems are equipped with wide-range pressure measurement. But for accurate monitoring, capacitance manometers can be fitted. Automatic pressure control: Where stabilised pressures are needed, automatic pressure control (APC) packages are available. Resolutions to 0.1 mTorr are readily possible based on feedback loops between capacitance manometer readings and MFC flow rates (upstream control).

Applications:

  • Graphene and 2D materials
  • Semiconductor film processing
  • Device annealing
  • Education
  • Product development
 
© 2017 Moorfield Nanotechnology Limited.